Manufacturing method of a flat panel display device

A manufacturing method of a flat panel display device comprising:

• forming a color filter substrate including:
• defining pixel areas on a transparent substrate;
• forming black matrixes surrounding the pixel areas;
• forming a first color filter in a first area among the pixel areas, and a first pigment layer having a first width in a spacer area directly on the black matrixes, by depositing and patterning a first pigment on the color filter substrate;
• forming a second color filter in a second area among the pixel areas, and a second pigment layer having a second width on the first pigment layer, by depositing and patterning a second pigment on the color filter substrate;
• forming a third color filter in a third area among the pixel areas, and a third pigment layer having a third width on the second pigment layer, by depositing and patterning a third pigment on the color filter substrate;
• and
• depositing an overcoat layer having a thickness of 1.8 μm-2.0 μm on the first, second and third color filters and the first, second and third pigment layers,
• wherein a spacer is formed for maintaining a cell gap between the color filter substrate and a thin film transistor substrate, wherein the spacer has a stacked structure that includes the black matrixes, the first pigment layer, the second pigment layer, and the third pigment layer, and, wherein the spacer has a height of 2.13 μm-2.42 μm,
• wherein at least one of the first width, the second width, and the third width of the pigment layers is a width different from other widths of the pigment layers in the stacked structure to control a height of the spacer, and
• wherein a height of the first pigment layer, a height of the second pigment layer, and a height of the third pigment layer are controlled by using CD loss of the first width of the first pigment layer, the second width of the second pigment layer, and the third width of the third pigment layer, respectively.