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US 9,051,211 B2Granted
Effects of methods of manufacturing sputtering targets on characteristics of coatings
AssigneePPG Industries Ohio, Inc.
InventorsJames J. Finley, Harry Buhay
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Abstract
Titanium and aluminum cathode targets are disclosed for sputtering absorbing coatings of titanium and aluminum-containing materials in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof, which can further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides, as well as metallic films. The titanium and aluminum-containing coatings can be utilized as an outer coat or as one or more coating layers of a coating stack.
Claims5
A method for depositing a transparent, multilayer, low emissivity coating, comprising:
- maintaining a transparent glass substrate in a chamber, wherein the substrate is larger than at least one square foot;
- and
- forming a transparent, low emissivity coating stack over at least a portion of the substrate, wherein the coating stack comprises at least one dielectric layer, at least one infrared reflecting metal layer, and at least one sacrificial primer layer, wherein the at least one infrared reflecting metal layer is located between the at least one dielectric layer and the substrate, wherein the at least one dielectric layer is selected from the group consisting of oxides, nitrides, and oxynitrides;
- wherein the at least one sacrificial primer layer is located between the at least one infrared reflecting metal layer and the at least one dielectric layer;
- wherein the at least one sacrificial primer layer has a varying composition versus depth, and is formed by:
- sputtering at least one cathode having a predefined mixture of aluminum to titanium, said cathode containing from 40 to 60 weight percent of aluminum;
- and
- reciprocally moving the substrate with respect to the cathode.
5 more elements
Dependencies are inferred from the claim text.