# US 9,040,943 B2 · Chamber and extreme ultraviolet light generation apparatus > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,040,943 B2 - Document ID: US9040943B2 - Status: Granted - Kind: B2 - Application number: 14/173,677 - Filed: 2014-02-05 - Published: 2014-08-07 - Granted: 2015-05-26 - Earliest claimed: 2013-02-06 - Assignees: Gigaphoton Inc. - Applicants: Gigaphoton Inc. - Inventors: Toshihiro Nishisaka - Web page: https://patentgrep.com/patent/US9040943B2 ## CPC - H05G 2/0092: {Housing of the apparatus for producing X-rays; Environment inside the housing} - G03F 7/70033: {by plasma extreme ultraviolet [EUV] sources} - H05G 2/0086: {Optical arrangements for conveying the laser beam to the plasma generation location} - H05G: X-RAY TECHNIQUE (investigating or analysing materials by the use of X-rays G01N23/00; apparatus for X-ray photography G03B42/02; X-ray tubes H01J35/00; TV systems having X-ray input H04N5/321) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam may include a chamber receptacle, a heat shield that is disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle and that is configured to absorb heat produced at the predetermined region when the target material turns into plasma, and a support portion configured to attach the heat shield to the chamber receptacle, and further, the support portion may include an absorbing portion configured to absorb stress produced in the heat shield deforming due to the heat, by expanding/contracting in response to the thermal deformation of the heat shield. ## Claims ### Claim 1 A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam, the chamber comprising: a chamber receptacle; a heat shield, disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle, configured to absorb heat produced at the predetermined region when the target material turns into plasma; and a support portion configured to attach the heat shield to the chamber receptacle, the support portion and the heat shield being separated from, and independent of, each other, the support portion including an elastic member configured to absorb stress produced in the heat shield deforming due to the heat, by elastically deforming in response to the thermal deformation of the heat shield. ### Claim 2 (depends on 1) The chamber according to claim 1, further comprising a plurality if support portions including the support portion, wherein each of the plurality of support portions includes an elastic member configured to absorb the stress produced in the heat shield deforming due to the heat by elastically deforming in response to the thermal deformation of the heat shield. ### Claim 3 (depends on 1) The chamber according to claim 1, wherein the elastic member is a plate spring. ### Claim 4 (depends on 3) The chamber according to claim 3, wherein the elastic member includes a body portion; and the body portion includes a plurality of grooves arranged in a radial direction of the heat shield and passing through the body portion. ### Claim 5 (depends on 1) An extreme ultraviolet light generation apparatus comprising: the chamber according to claim 1; a target supply device configured to supply the target material to a predetermined region in the chamber; a laser beam focusing optical system configured to turn the target material into plasma by focusing a laser beam on the target material supplied to the predetermined region by the target supply device; and a collector mirror configured to reflect and focus extreme ultraviolet light radiated from the plasma. ### Claim 6 A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam, the chamber comprising: a chamber receptacle; a heat shield, disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle, configured to absorb heat produced at the predetermined region when the target material turns into plasma; and a plurality of support portions configured to attach the heat shield to the chamber receptacle, the heat shield being cylindrical in shape and extending from an entry side of the laser beam to an output side of the extreme ultraviolet light; and the heat shield including a slot that extends from one end of the heat shield to the other end of the heat shield and that is configured to expand/contract in response to the thermal deformation of the heat shield, wherein the heat shield includes a plurality of slits that extend from the one end of the heat shield to the other end of the heat shield and that are configured to expand/contract in response to the thermal deformation of the heat shield; the heat shield is divided into a plurality of portions by the plurality of slits; and the plurality of portions resulting from the division are attached to the chamber receptacle by plurality of support portions, respectively. ### Claim 7 (depends on 6) An extreme ultraviolet light generation apparatus comprising: the chamber according to claim 6; a target supply device configured to supply the target material to a predetermined region in the chamber; a laser beam focusing optical system configured to turn the target material into plasma by focusing a laser beam on the target material supplied to the predetermined region by the target supply device; and a collector mirror configured to reflect and focus extreme ultraviolet light radiated from the plasma.