# US 9,040,312 B2 · Method for producing ferroelectric thin film

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- Number: US 9,040,312 B2
- Document ID: US9040312B2
- Status: Granted
- Kind: B2
- Application number: 14/061,035
- Filed: 2013-10-23
- Published: 2014-05-22
- Granted: 2015-05-26
- Earliest claimed: 2012-11-20
- Assignees: Mitsubishi Materials Corporation
- Applicants: Mitsubishi Materials Corporation
- Inventors: Shintaro Iida; Hideaki Sakurai
- Web page: https://patentgrep.com/patent/US9040312B2

## CPC

- H10N 30/093: Forming inorganic materials
- H10D 1/682: {having dielectrics comprising perovskite structures}
- H10N 30/078: by sol-gel deposition
- H10P 14/6342: {Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating}
- H10P 14/6514: {by exposure to a plasma}
- H10P 14/69398: {the material having a perovskite structure, e.g. BaTiO3}
- H10D 1/694: {comprising noble metals or noble metal oxides}
- H10N: ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10

## Abstract

It is possible to produce a ferroelectric thin film controlled to have the preferential crystal orientation in the (100) plane with a simple process without providing a seed layer or a buffer layer. A ferroelectric thin film is produced on a lower electrode by irradiating a surface of the lower electrode of a substrate having the lower electrode where the crystal plane is oriented in a (111) axis direction, with an atmospheric pressure plasma, coating a composition for forming a ferroelectric thin film on the lower electrode, and heating and crystallizing the coated composition.

## Claims

### Claim 1

A method for producing a ferroelectric film on a lower electrode by coating a composition for forming a ferroelectric film on the lower electrode of a substrate having the lower electrode where a crystal plane is oriented in the (111) axis direction, calcining the coated composition, and then firing and crystallizing the coated composition, the method comprising:
irradiating a surface of the lower electrode with an atmospheric pressure plasma before coating the composition for forming a ferroelectric film; and
coating, calcining and firing the composition for forming a ferroelectric film on the lower electrode to form the ferroelectric film controlled to have a preferential crystal orientation in the (100) plane,
wherein an introduction gas when the lower electrode is irradiated with the atmospheric pressure plasma is O2 or N2, or a mixture thereof; and
wherein the composition is an organic metal compound solution that a raw material for a metal composite oxide is dissolved in an organic solvent.

### Claim 2 (depends on 1)

A method for producing a composite electronic part such as a film capacitor, a capacitor, an IPD, a capacitor for a DRAM memory, a stacked capacitor, a gate insulator of a transistor, a non-volatile memory, a pyroelectric infrared sensor, a piezoelectric element, an electro-optic element, an actuator, a resonator, an ultrasonic motor, an electric switch, an optical switch, or an LC noise filter element, using the method for producing a ferroelectric film according to claim 1.

### Claim 3 (depends on 1)

The method for producing a ferroelectric film according to claim 1, wherein the raw material for the metal composite oxide is one or more compounds in which an organic group is connected to each metallic element which is selected from at least one of a group consisting of Pb, La, Zr, and Ti via oxygen or nitrogen atom of the organic group.

### Claim 4 (depends on 1)

The method for producing a ferroelectric film according to claim 1, wherein the raw material for the metal composite oxide is one or more compounds which is selected from at least one of a group consisting of metal alkoxide, hydrolysate of the metal alkoxide, and organic salt of the metal hydroxide wherein the metal is selected from the group consisting of Pb, La, Zr and Ti.

### Claim 5 (depends on 1)

The method for producing a ferroelectric film according to claim 1, wherein the raw material for the metal composite oxide is one or more compounds selected from a group consisting of lead acetate(Pb(OAc)2), lanthanum acetate (La(OAc)3), titanium tetraisopropoxide (Ti(OiPr)4), titanium tetra-n-butoxide (Ti(OnBu)4), and zirconium alkoxide.