# US 9,040,149 B2 · Printing plate and method for manufacturing same

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 9,040,149 B2
- Document ID: US9040149B2
- Status: Granted
- Kind: B2
- Application number: 14/241,840
- Filed: 2012-09-03
- Published: 2014-07-31
- Granted: 2015-05-26
- Earliest claimed: 2011-09-02
- Assignees: LG Chem, Ltd.
- Applicants: Ji Young Hwang; Jeseob Park; In-Seok Hwang; Seung Heon Lee
- Inventors: Ji Young Hwang; Jeseob Park; In-Seok Hwang; Seung Heon Lee
- Web page: https://patentgrep.com/patent/US9040149B2

## CPC

- B41N 1/00: Printing plates or foils; Materials therefor
- B41N 1/06: for relief printing or intaglio printing
- B41N 1/12: non-metallic other than stone {, e.g. printing plates or foils comprising inorganic materials in an organic matrix (B41N1/003, B41N1/006 take precedence)}
- Y10T 428/24802: Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- B41N: PRINTING PLATES OR FOILS (photosensitive material G03); MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

The present invention relates to a cliché and a method for manufacturing the same, and the cliché according to the present invention comprises a cliché comprising: a groove pattern, wherein the groove pattern comprises a region composed of linear patterns which do not intersect with each other and the region composed of linear patterns is a square region comprising two or more lines of a linear pattern in the region and comprises a region in which the line width (W) and the depth (D) of the linear pattern and the ratio (R) of a region which does not comprise the linear pattern in the square region and the aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the linear pattern, satisfy specific relationship equation(s). The cliché according to the present invention may prevent the bottom touch phenomenon of ink transferred onto the cliché.

## Claims

### Claim 1

A cliché, comprising:
a groove pattern, and
a reflective layer provided on at least some regions other than the groove pattern on the cliché, wherein the reflective layer comprises one or more selected from the group consisting of chromium, molybdenum, tungsten and oxides thereof,
wherein the groove pattern comprises a region composed of linear patterns which do not intersect with each other and the region composed of linear patterns is a square region comprising two or more lines of a linear pattern in the region and comprises a region in which a line width (W) and a depth (D) of the linear pattern and the ratio (R) of a region which does not comprise the linear pattern in the square region and an aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the linear pattern, satisfy the following Relationship Equations 1 and 2:
W=2D+W0+X [Relationship Equation 1]
D≧42.9exp(−R/0.35)−1.5 [Relationship Equation 2]
wherein, X is a constant,
D, W, W0 and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 2 (depends on 1)

The cliché of claim 1, wherein the line width (W) and a pitch (P) of the linear pattern in the square region and the ratio (R) of the region which does not comprise the linear pattern in the square region additionally satisfy the following Relationship Equation 3:
R=P(P−W)/P2=(P−W)/P [Relationship Equation 3]
wherein, W, P and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 3 (depends on 1)

The cliché of claim 1, wherein the linear pattern is a regular or irregular pattern.

### Claim 4 (depends on 1)

The cliché of claim 1, wherein the linear pattern comprises a straight line, a curved line, a zigzag line or a combination thereof.

### Claim 5 (depends on 1)

The cliché of claim 1, wherein the region satisfying the Relationship Equations 1 and 2 takes up 50% or more of the total groove pattern region.

### Claim 6 (depends on 1)

The cliché of claim 1, wherein the groove pattern comprises two or more patterns having different ratios (R) of a region which does not comprise the linear pattern in the square region, the two or more patterns have the same depth (D), and the depth (D) satisfies the Relationship Equations 1 and 2 based on a pattern having the smallest ratio (R) of a region which does not comprise the linear pattern.

### Claim 7 (depends on 1)

The cliché of claim 1, wherein the groove pattern comprises two or more patterns having different ratios (R) of a region which does not comprise the linear pattern in the square region, and the depth (D) of the two or more patterns satisfies the Relationship Equations 1 and 2, respectively.

### Claim 8

A cliché, comprising:
a groove pattern, and
a reflective layer provided on at least some regions other than the groove pattern on the cliché, wherein the reflective layer comprises one or more selected from the group consisting of chromium, molybdenum, tungsten and oxides thereof,
wherein the groove pattern comprises a region composed of a network pattern and the region composed of a network pattern is a square region comprising three or more intersection points of lines constituting the network pattern in the region and comprises a region in which a line width (W) and a depth (D) of the network pattern and a ratio (R) of a region which does not comprise the network pattern in the square region and an aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the network pattern, satisfy the following Relationship Equations 1 and 4:
W=2D+W0+X [Relationship Equation 1]
D≧33.8exp(−R/0.235)+0.82 [Relationship Equation 4]
wherein, X is a constant,
D, W, W0 and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 9 (depends on 8)

The cliché of claim 8, wherein the line width (W) and a pitch (P) of the network pattern in the square region and the ratio (R) of the region which does not comprise the network pattern in the square region additionally satisfy the following Relationship Equation 5:
R=(P−W)2/P2=(1−W/P)2 [Relationship Equation 5]
wherein, W, P and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 10 (depends on 8)

The cliché of claim 8, wherein the network pattern is a regular or irregular pattern.

### Claim 11 (depends on 8)

The cliché of claim 8, wherein the region satisfying the Relationship Equations 1 and 4 takes up 50% or more of the total groove pattern region.

### Claim 12 (depends on 8)

The cliché of claim 8, wherein the groove pattern comprises two or more patterns having different ratios (R) of a region which does not comprise the network pattern in the square region, the two or more patterns have the same depth (D), and the depth (D) satisfies the Relationship Equations 1 and 4 based on a pattern having the smallest ratio (R) of a region which does not comprise the linear pattern.

### Claim 13 (depends on 8)

The cliché of claim 8, wherein the groove pattern comprises two or more patterns having different ratios (R) of a region which does not comprise the network pattern in the square region, and the depth (D) of the two or more patterns satisfies the Relationship Equations 1 and 4, respectively.

### Claim 14

A cliché, comprising:
a groove pattern, and
a reflective layer provided on at least some regions other than the groove pattern on the cliché, wherein the reflective layer comprises one or more selected from the group consisting of chromium, molybdenum, tungsten and oxides thereof,
wherein the groove pattern comprises a region composed of a network pattern and a segmented pattern of the network pattern and the region is a square region comprising three or more intersection points of lines constituting the network pattern in the region and comprises a region in which the line width (W) and the depth (D) of the network pattern and the ratio (R) of a region which does not comprise the network pattern and the segmented pattern of the network pattern in the square region and the aperture line width (W0) of a mask pattern for forming a pattern, which corresponds to the network pattern and the segmented pattern of the network pattern, satisfy the following Relationship Equations 1 and 4:
W=2D+W0+X [Relationship Equation 1]
D≧33.8exp(−R/0.235)+0.82 [Relationship Equation 4]
wherein, X is a constant,
D, W, W0 and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 15 (depends on 14)

The cliché of claim 14, wherein the line width (W) and a pitch (P) of the network pattern and the segmented pattern of the network pattern in the square region and the ratio (R) of the region which does not comprise the network pattern and the segmented pattern of the network pattern in the square region additionally satisfy the following Relationship Equation 5:
R=(P−W)2/P2=(1−W/P)2 [Relationship Equation 5]
wherein, W, P and X are values of micrometer units, and
R is a value more than 0 and less than 1.

### Claim 16 (depends on 14)

The cliché of claim 14, wherein the region satisfying the Relationship Equations 1 and 4 takes up 50% or more of the total groove pattern region.

### Claim 17 (depends on 1)

The cliché of claim 1, wherein the groove pattern comprises a linear pattern in which patterns do not intersect with each other, a network pattern or all of them.

### Claim 18 (depends on 1)

The cliché of claim 1, wherein the depth (D) of the groove pattern is 100 μm or less.

### Claim 19 (depends on 1)

The cliché of claim 1, wherein the cliché is for reverse offset printing.

### Claim 20 (depends on 1)

The cliché of claim 1, wherein a bottom touch phenomenon does not substantially occur to the groove pattern when ink is transferred onto the cliché.

### Claim 21 (depends on 1)

A printed matter which is manufactured by using the cliché of claim 1 and comprises a printing pattern corresponding to the groove pattern of the cliché.

### Claim 22 (depends on 21)

The printed matter of claim 21, wherein a non-printed region takes up 10% or less of a region corresponding to the groove pattern of the cliché in the printing pattern.

### Claim 23 (depends on 21)

The printed matter of claim 21, wherein a difference between the largest line width and the smallest line width of the printing pattern is 50 μm or less.

### Claim 24 (depends on 21)

A touch screen sensor comprising the printed matter of claim 21.