# US 9,039,837 B2 · Film deposition apparatus and substrate processing apparatus

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- Number: US 9,039,837 B2
- Document ID: US9039837B2
- Status: Granted
- Kind: B2
- Application number: 13/550,902
- Filed: 2012-07-17
- Published: 2013-01-24
- Granted: 2015-05-26
- Earliest claimed: 2011-07-21
- Assignees: Tokyo Electron Limited
- Applicants: Manabu Honma
- Inventors: Manabu Honma
- Web page: https://patentgrep.com/patent/US9039837B2

## CPC

- C23C 16/402: {Silicon dioxide}
- C23C 16/4412: {Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps}
- C23C 16/45548: {having arrangements for gas injection at different locations of the reactor for each ALD half-reaction}
- C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04)

## Abstract

A film deposition apparatus includes a processing chamber; a rotary table; process regions provided in the processing chamber and arranged apart from each other in the rotational direction of the rotary table; reaction gas supplying units configured to supply reaction gases of different types to the corresponding process regions; separation regions provided between the process regions; separation gas supplying units configured to supply a separation gas to the separation regions to separate the atmospheres of the process regions; and an exhaust path forming part having openings at positions corresponding to the process regions and configured to form exhaust paths for separately guiding the atmospheres of the process regions from the openings to the corresponding exhaust ports of the processing chamber for exhausting atmospheres of the process regions. The exhaust path forming part is configured such that positions of the openings in the rotational direction are changeable.

## Claims

### Claim 1

A film deposition apparatus for forming a film on a substrate, comprising:
a processing chamber;
a rotary table disposed in the processing chamber and configured to hold the substrate;
a plurality of process regions provided in the processing chamber and arranged apart from each other in a rotational direction of the rotary table, the processing chamber having exhaust ports for exhausting atmospheres of the process regions;
a plurality of reaction gas supplying units configured to supply reaction gases of different types to the corresponding process regions;
one or more separation regions provided between the process regions;
one or more separation gas supplying units configured to supply a separation gas to the separation regions to separate the atmospheres of the process regions; and
an exhaust path forming part having openings at positions corresponding to the process regions and configured to form exhaust paths for separately guiding the atmospheres of the process regions from the openings to the corresponding exhaust ports,
wherein the exhaust path forming part is configured such that positions of the openings in the rotational direction are changeable.

### Claim 2 (depends on 1)

The film deposition apparatus as claimed in claim 1, wherein
the openings of the exhaust path forming part includes a first opening and a second opening;
the exhaust paths includes a first exhaust path connected to the first opening and a second exhaust path connected to the second opening; and
the first exhaust path and the second exhaust path extend in the rotational direction of the rotary table in parallel with each other.

### Claim 3 (depends on 1)

The film deposition apparatus as claimed in claim 1, wherein the exhaust path forming part is attachable to and detachable from the processing chamber.

### Claim 4 (depends on 3)

The film deposition apparatus as claimed in claim 3, wherein the exhaust path forming part is replaceable with another exhaust path forming part having openings at positions that are different from the positions of the openings of the exhaust path forming part in the rotational direction.

### Claim 5 (depends on 1)

The film deposition apparatus as claimed in claim 1, wherein
the exhaust path forming part includes
a body configured to form the exhaust paths, and
an opening forming part configured to form the openings; and
a position of the opening forming part with respect to the body is changeable in the rotational direction.

### Claim 6 (depends on 1)

The film deposition apparatus as claimed in claim 1, wherein
exhaust positions in the processing chamber from which the atmospheres of the process regions are exhausted to the exhaust ports are changeable by changing the positions of the openings of the exhaust path forming part.

### Claim 7

A substrate processing apparatus for processing a substrate, comprising:
a processing chamber;
a rotary table disposed in the processing chamber and configured to hold the substrate;
a plurality of process regions provided in the processing chamber and arranged apart from each other in a rotational direction of the rotary table, the processing chamber having exhaust ports for exhausting atmospheres of the process regions;
a plurality of reaction gas supplying units configured to supply reaction gases of different types to the corresponding process regions;
one or more separation regions provided between the process regions;
one or more separation gas supplying units configured to supply a separation gas to the separation regions to separate the atmospheres of the process regions; and
an exhaust path forming part having openings at positions corresponding to the process regions and configured to form exhaust paths for separately guiding the atmospheres of the process regions from the openings to the corresponding exhaust ports,
wherein the exhaust path forming part is configured such that positions of the openings in the rotational direction are changeable.