# US 9,039,402 B2 · Imprinting apparatus and method therefor > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 9,039,402 B2 - Document ID: US9039402B2 - Status: Granted - Kind: B2 - Application number: 12/566,513 - Filed: 2009-09-24 - Published: 2010-03-25 - Granted: 2015-05-26 - Earliest claimed: 2008-09-25 - Assignees: Canon Kabushiki Kaisha - Applicants: Eigo Kawakami; Shingo Okushima; Hideki Ina; Junichi Seki; Atsunori Terasaki; Motoki Okinaka - Inventors: Eigo Kawakami; Shingo Okushima; Hideki Ina; Junichi Seki; Atsunori Terasaki; Motoki Okinaka - Web page: https://patentgrep.com/patent/US9039402B2 ## CPC - B29C 43/021: {characterised by the shape of the surface} - B29C 43/003: {characterised by the choice of material} - B29C 43/14: in several steps - B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic - B82Y 40/00: Manufacture or treatment of nanostructures - G03F 7/0002: {Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping} - B29C 43/58: Measuring, controlling or regulating {(for bank adjustment in calendering B29C43/245)} - B29C 2043/025: {forming a microstructure, i.e. fine patterning} - B29C 2043/142: {by moving a single mould or the article progressively, i.e. portionwise} - B29C 2043/5833: {movement of moulds or mould parts, e.g. opening or closing, actuating} - B29C 2059/023: {Microembossing} - B29C: SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING (making preforms B29B11/00; making laminated products by combining previously unconnected layers which become one product whose layers will remain together B32B37/00 - B32B41/00) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel. ## Claims ### Claim 1 An imprinting apparatus that transfers a pattern of a mold to a resin on a substrate by a step-and-repeat imprint, the imprinting apparatus comprising: a substrate stage consisting of a single substrate stage; a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the mold and the deposition mechanism; and a control unit configured to control the deposition mechanism and the first and second driving mechanisms so as to perform an N+Mth resin deposition process of depositing the resin onto the substrate and an Nth imprint process of transferring the pattern of the mold to the resin on the substrate in parallel, wherein N and M are positive integers; wherein a driving range of the second driving mechanism is wider than a size of the pattern of the mold such that M may be an integer greater than one; and wherein the control unit is configured to change a relative position of the mold and the deposition mechanism in performing the resin deposition process and the imprint process in parallel. ### Claim 2 (depends on 1) The imprinting apparatus according to claim 1, further comprising: a housing configured to accommodate the deposition mechanism, the first driving mechanism, and the second driving mechanism, wherein the first driving mechanism is disposed between the substrate and the housing, and wherein the second driving mechanism is disposed between the deposition mechanism and the housing. ### Claim 3 (depends on 1) The imprinting apparatus according to claim 1, further comprising: a housing configured to accommodate the deposition mechanism, the first driving mechanism, and the second driving mechanism, wherein the first driving mechanism is disposed between the substrate and the housing, and wherein the second driving mechanism is disposed between the deposition mechanism and a member that joins the mold to the housing. ### Claim 4 (depends on 1) The imprinting apparatus according to claim 1, further comprising a plurality of the deposition mechanisms and a plurality of the second driving mechanisms. ### Claim 5 (depends on 1) The imprinting apparatus according to claim 1, wherein the control unit performs the control so as to perform the Nth imprint process and the N+Mth resin deposition process in parallel, where N is a positive integer and M is an integer greater than or equal to 2. ### Claim 6 (depends on 1) The imprinting apparatus according to claim 1, wherein the control unit performs the continuous resin deposition process and imprint process at intervals larger than the widths of areas on the substrate on which the processes will be performed. ### Claim 7 (depends on 6) The imprinting apparatus according to claim 6, wherein the interval between the continuous resin deposition process and imprint process is an integral multiple of the width of an area on the substrate on which each process will be performed.