Dampening fluid deposition by condensation in a digital lithographic system

A variable data lithography system, comprising:

• an imaging member having an arbitrarily reimageable surface;
• a dampening fluid subsystem for applying a layer of dampening fluid to said reimageable surface, comprising:
• a dampening fluid reservoir configured to provide dampening fluid in an airborne state to said reimageable surface;
• a flow conduit communicatively coupled to said dampening fluid reservoir and within which said airborne dampening fluid may travel from said dampening fluid reservoir toward said reimageable surface;
• a flow control structure for confining airborne dampening fluid provided from said flow conduit to a condensation region to support forming said layer of dampening fluid on said reimageable surface by way of condensation of said airborne dampening fluid over said reimageable surface, wherein the flow control structure has one or more slots disposed such that a pressurized gas exits therefrom in the direction of said reimageable surface;
• a plurality of control devices to maintain the flow control structure at a temperature higher than the reimageable surface and to operate a heating element in the dampening fluid reservoir thereby to control the temperature of the dampening fluid in the airborne state;
• an extraction subsystem for extracting excess airborne dampening fluid that does not condense over said reimageable surface from said condensation region;
• a patterning subsystem for selectively removing portions of the dampening fluid layer so as to produce an image in the dampening fluid;
• a barrier structure configured to be disposed between said flow control structure and the patterning subsystem in a direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing said dampening fluid layer between the point of evaporation and the patterning subsystem;
• a controller to compare a thickness of said dampening fluid layer at a location following said condensation region to a target thickness so as to generate control signals;
• an inking subsystem for applying ink over the reimageable surface such that said ink selectively occupies regions where dampening fluid was removed by the patterning subsystem to thereby form an inked latent image;
• an image transfer subsystem for transferring the inked latent image to a substrate;
• and
• a cleaning subsystem for removing residual ink and dampening fluid from the reimageable surface.

A subsystem for forming a dampening fluid layer over a reimageable surface of an imaging member in a variable data lithography system, comprising:

• a dampening fluid reservoir configured to provide dampening fluid in an airborne state to said reimageable surface, wherein the dampening fluid is selected from a group consisting of hexafluoropropoxy or octamethylcyclotetrasiloxane;
• a flow conduit communicatively coupled to said dampening fluid reservoir and within which said airborne dampening fluid may travel from said dampening fluid reservoir toward said reimageable surface;
• an apparatus to control temperature of the reimageable surface;
• a flow control structure for confining airborne dampening fluid provided from said flow conduit to a condensation region to support forming a dampening fluid layer on said reimageable surface by way of condensation of said airborne dampening fluid over said reimageable surface;
• a gas transport device for transporting particles of said dampening fluid vapor from said dampening fluid reservoir to said reimageable surface;
• a thickness sensor for determining the thickness of said dampening fluid layer at a location following said condensation region;
• an extraction subsystem for extracting excess airborne dampening fluid that does not condense over said reimageable surface from said condensation region;
• a barrier structure configured to be disposed between said flow control structure and an optical patterning subsystem in a direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing said dampening fluid layer between the point of evaporation and the optical patterning subsystem;
• a control mechanism for controlling aspects of the extent of condensation of said airborne dampening fluid by:
• controlling temperature of said flow control structure;
• controlling vapor concentration of the dampening fluid of an ambient proximate said reimageable surface;
• controlling temperature of the reimageable surface;
• and
• controlling exposure time of said reimageable surface to the airborne dampening fluid.

An apparatus in a variable data lithography system to form a dampening fluid layer over a reimageable surface of an imaging member, comprising:

• a dampening fluid reservoir configured to provide dampening fluid in an airborne state to said reimageable surface, wherein the dampening fluid is selected from a group consisting of hexafluoropropoxy, water, and octamethylcyclotetrasiloxane;
• a flow conduit communicatively coupled to said dampening fluid reservoir and within which said airborne dampening fluid may travel from said dampening fluid reservoir toward said reimageable surface;
• a flow control structure for confining airborne dampening fluid provided from said flow conduit to a condensation region to support forming a dampening fluid layer on said reimageable surface by way of condensation of said airborne dampening fluid over said reimageable surface;
• a gas transport device for transporting particles of said dampening fluid vapor from said dampening fluid reservoir to said reimageable surface;
• a flow control device controlling the flow of airborne dampening fluid between said dampening fluid reservoir and said condensation region, and further comprising a controller communicatively coupled to said thickness sensor and said flow control device, said controller configured such that a thickness determined by said thickness sensor may be compared to a target thickness and in response to said comparison said controller may provide a signal to said flow control device to adjust the flow of said airborne dampening fluid to thereby control the extent of condensation of said dampening fluid;
• an apparatus that controls vapor concentration of the dampening fluid of an ambient proximate said reimageable surface;
• an apparatus that controls temperature of the reimageable surface;
• an apparatus that controls exposure time of said reimageable surface to the airborne dampening fluid;
• a barrier structure configured to be disposed between said flow control structure and an optical patterning subsystem in a direction of travel of said imaging member to prevent evaporated dampening fluid from settling on said dampening fluid layer following evaporation and to otherwise prevent disturbing said dampening fluid layer between the point of evaporation and the optical patterning subsystem;
• and
• an extraction subsystem for extracting excess airborne dampening fluid that does not condense over said reimageable surface from said condensation region;
• wherein said controller is communicatively coupled to a control mechanism for actuating, in response to said comparison of said thickness and said target thickness, an apparatus for controlling aspects of the extent of condensation of said airborne dampening fluid selected from the group consisting of:
• an apparatus that controls a temperature of the airborne dampening fluid flowing to said condensation region.