Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus
AssigneeKorea Institute of Machinery & Materials
InventorsEung-Sug Lee, Joo Yun Jung, Jun Hyuk Choi, Jae Won Hahn
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Abstract
There is provided a method of manufacturing a stamp for a plasmonic nanolithography apparatus. The method includes forming metal patterns on a substrate, coating a hydrophobic thin film on external surfaces of the metal patterns to hydrophobic processing the external surfaces of the metal patterns, selectively hydrophilic processing only the external surfaces of the metal patterns, laminating a buffer layer on the substrate and the metal patterns, and transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.
Claims9
A method of manufacturing a stamp for a plasmonic nanolithography apparatus, comprising:
- forming metal patterns on a substrate;
- coating a hydrophobic thin film on external surfaces of the substrate and the metal patterns;
- selectively hydrophilic processing only the external surfaces of the metal patterns;
- laminating a buffer layer on the substrate and the metal patterns;
- and
- transcribing the metal patterns and the buffer layer from the substrate to a base formed of light transmission material to be combined with the base.
Dependencies are inferred from the claim text.