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US 9,012,030 B2Granted
Process chamber component having yttrium—aluminum coating
AssigneeApplied Materials, Inc.
InventorsNianci Han, Li Xu, Hong Shih
Life of this patent
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Abstract
A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.
Claims18
A substrate processing chamber component comprising:
- (a) a process chamber component structure composed of a metal alloy;
- and
- (b) an yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating having a compositional gradient through a thickness of the coating.
A substrate processing chamber component comprising:
- (a) a process chamber component structure composed of a metal alloy;
- and
- (b) a plasma sprayed coating on the chamber component structure, the coating composed of a metal alloy of yttrium and aluminum.
A substrate processing chamber component comprising:
- (a) a process chamber component structure composed of a metal alloy;
- and
- (b) an yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating (i) composed of yttrium and aluminum, (ii) having a compositional gradient through a thickness of the coating, and (iii) forming a unitary and continuous structure with the chamber component structure.
A substrate processing chamber component comprising:
- (a) a process chamber component structure composed of a metal alloy;
- and
- (b) a plasma sprayed yttrium-aluminum coating on the chamber component structure, the yttrium-aluminum coating having a compositional gradient through a thickness of the coating.
Dependencies are inferred from the claim text.