Apparatuses and methods for seaming substrates

A method for forming a seam, the method comprising the steps of:

• rotating a forming cylinder about an axis of rotation, the forming cylinder comprising a fluid orifice, a pressure applying member extending radially outward from the forming cylinder, and a fluid outlet extending through the pressure applying member;
• rotating an anvil cylinder adjacent the forming cylinder;
• advancing a first substrate in a machine direction on the forming cylinder with a separation distance Y between the fluid orifice and the first substrate;
• advancing a second substrate in the machine direction wherein the first substrate is between the second substrate and the forming cylinder;
• maintaining the separation distance between the first substrate and the fluid orifice with the pressure applying member;
• heating a fluid to a temperature sufficient to at least partially melt the substrates;
• directing a jet of the heated fluid through the fluid orifice and onto an overlap area of the first and second substrates;
• partially melting the overlap area;
• and
• compressing the overlap area in a nip between the pressure applying member and the anvil cylinder.