Pattern generator for a lithography system
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChen-Hua Yu, Tien-I Bao, Chih Wei Lu, Jaw-Jung Shin, Shy-Jay Lin, Burn Jeng Lin
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Abstract
A pattern generator includes a minor array plate having a mirror, at least one electrode plate disposed over the minor array plate, a lens let disposed over the minor, and at least one insulator layer sandwiched between the mirror array plate and the electrode plate. The electrode plate includes a first conducting layer and a second conducting layer. The lens let has a non-straight sidewall formed in the electrode plate. The pattern generator further includes at least one insulator sandwiched between two electrode plates. The non-straight sidewall can be a U-shaped sidewall or an L-shaped sidewall.
Claims20
A pattern generator comprising:
- a mirror array plate including a mirror;
- a first electrode plate disposed over the mirror array plate, wherein the first electrode plate includes at least one first conducting layer and at least one second conducting layer;
- a lens let disposed over the mirror, wherein the lens let includes a non-straight sidewall formed in the first electrode plate;
- and
- a first insulator layer sandwiched between the mirror array plate and the first electrode plate.
A method for fabricating a pattern generator, the method comprising:
- receiving a mirror array plate having a mirror;
- depositing at least one insulator layer over the mirror array plate;
- forming at least one electrode plate over the insulator layer, wherein forming the electrode plate including depositing at least one first conducting layer over the insulator and at least one second conducting layer over the first conducting layer;
- and
- forming a lens let over the mirror, wherein forming the lens let includes performing a recess etching to form a non-straight sidewall in the electrode plate.
A pattern generator comprising:
- a mirror array plate including a mirror;
- a first electrode plate disposed over the mirror array plate, wherein the first electrode plate includes at least one first conducting layer and at least one second conducting layer and, wherein the electrode plate is parallel to the mirror array plate;
- a lens let disposed over the mirror, wherein the lens let includes a non-straight sidewall formed in the first electrode plate;
- and
- a first insulator layer sandwiched between the mirror array plate and the first electrode plate;
- wherein the first conducting layer is different from the second conducting layer.
Dependencies are inferred from the claim text.