Ultra-large size flat panel display maskless photolithography system and method
OwnerWenhui Mei, Weichong Du +1inventors
InventorsWenhui Mei, Weichong Du, Lujie Qu
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Abstract
A maskless exposure system that has multiple maskless optical engines arranged in an (N×M) matrix that form and project a pattern onto a substrate. A first stage system is capable of driving the maskless optical engines in a first direction, a second stage system capable of holding and moving the substrate in a second direction perpendicular to the first direction. A control system that processes data and synchronizing movement of the first and second stage systems and a vision system that detects the positions of the second stage system to synchronize movements with the multiple optical engines.
Claims23
A maskless exposure system comprising:
- a plurality of maskless optical engines that form and project a pattern onto a substrate, wherein said plurality of optical engines are arranged in a matrix of M rows and N columns;
- a first stage system coupled to said maskless optical engines, said first stage system drives said maskless optical engines in a first direction;
- and
- a second stage system that holds and moves said substrate in a second direction perpendicular to said first direction;
- a control system communicably coupled to said second stage system, said control system processes data and synchronizes the drive of said first stage system with the movement of said second stage system;
- a vision system communicably coupled to said control system, said vision system detects a position of said second stage system to synchronize movements with said plurality of optical engines;
- a reference mark late that is adjacent to said second stage and separate from the substrate, and marks a set of moving positions of said plurality of maskless optical engines wherein said marks including a start point, an end point and a line of movement for each maskless optical engine;
- and
- wherein control system is configured to coordinate the change of light intensity and scan speed of each maskless optical engine along the direction of its movement to smooth the transition from one maskless engine's exposure area to next adjacent maskless engine's exposure area so that the pattern can be seamlessly exposed to all parts of the substrate.
A method of projecting a pixel-mask pattern onto a plate having a first side coated with a first photosensitive material, said plate having a second side coated with a second photosensitive material, said method using a plurality of maskless optical engines arranged in a matrix of M rows and N columns:
- forming a pattern;
- projecting said pattern onto a substrate;
- driving said maskless optical engines in a first direction;
- and
- moving said substrate in a second direction perpendicular to said first direction;
- synchronizing said driving of a first stage system and said moving of a second stage system;
- detecting positions of said second stage system to synchronize movements with said plurality of optical engines;
- marking the moving positions of said plurality of maskless optical engines wherein said marks including a start point, an end point and a line of movement;
- calibrating, at least one relative position with said substrate;
- and
- coordinating the change of light intensity and scan speed of each maskless optical engine along the direction of its movement to smooth the transition from one maskless engine's exposure area to next adjacent maskless engine's exposure area so that the pattern can be seamless exposed to all parts of the substrate.
Dependencies are inferred from the claim text.