Liquid crystal display and manufacturing method thereof
AssigneeSamsung Display Co., Ltd.
InventorsGwan-Soo Kim, Chul Huh, Dong-Uk Kang
Life of this patent
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Abstract
A manufacturing method of a liquid crystal display includes: forming a thin film transistor on a first substrate; forming a color filter on the thin film transistor; forming a pixel electrode on the color filter; and forming a light blocking member including a column spacer protruded from the light blocking member on the color filter. The forming the light blocking member uses a mask including a first region, a second region, and a third region. The first region passes light generated from a light exposer, the second region includes a blocking filter layer which selectively passes the light generated from the light exposer, and the third region blocks the light generated from the light exposer.
Claims11
A method of manufacturing a liquid crystal display, the method comprising:
- forming a thin film transistor on a first substrate;
- forming a color filter on the thin film transistor;
- forming a pixel electrode on the color filter;
- and
- forming a light blocking member including a column spacer which protrudes from an upper surface thereof, on the color filter,
- wherein the column spacer is formed in single body with the light blocking member, and
- wherein the forming the light blocking member uses a mask including a first region, a second region, and a third region, wherein
- the first region passes light generated from a light exposer,
- the second region includes a blocking filter layer which passes light of a predetermined wavelength band and which blocks light of wavelength bands other than that of the predetermined wavelength band, among wavelength bands of the light generated from the light exposer, and
- the third region blocks the light generated from the light exposer.
A method of manufacturing a liquid crystal display, the method comprising:
- forming a thin film transistor on a first substrate;
- forming a color filter on the thin film transistor;
- forming a pixel electrode on the color filter;
- and
- forming a light blocking member including a column spacer which protrudes from an upper surface thereof, on the color filter,
- wherein the forming the light blocking member comprises:
- coating a photoresist on the color filter, the photoresist including two initiators having different absorption wavelength bands,
- exposing the coated photoresist using a mask including a first region, a second region, and a third region, wherein
- the first region passes light generated from a light exposer,
- the second region includes a blocking filter layer which selectively passes the light generated from the light exposer, and
- the third region blocks the light generated from the light exposer, and
- developing the photoresist to form the column spacer at a position corresponding to the first region and to form the light blocking member at a position corresponding to the second region.
Dependencies are inferred from the claim text.