Display device and method of fabricating the same
AssigneeLG Display Co., Ltd.
InventorYoungHak Lee
Life of this patent
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Abstract
Disclosed are a display device and a method of fabricating the same. A pad for a display device includes: an oxide semiconductor layer formed on a substrate; a lower insulation layer formed on the oxide semiconductor layer to at least partially overlap the oxide semiconductor layer; one or more line layers formed on the lower insulation layer; an upper insulation layer formed on the one or more line layers; and a pad electrode formed on the upper insulation layer and connected to the one or more line layers through a contact hole formed in the upper insulation layer.
Claims26
A pad for a display device comprising a display area and a pad area, the pad to connect a gate line and a data line from one or more drivers to display elements in the pixel area, the pad comprising:
- an oxide semiconductor layer formed on a substrate;
- a lower insulation layer formed on the oxide semiconductor layer to at least partially overlap the oxide semiconductor layer;
- one or more line layers formed on the lower insulation layer;
- an upper insulation layer formed on the one or more line layers;
- and
- a pad electrode formed on the upper insulation layer and connected to the one of the one or more line layers through a contact hole formed in the upper insulation layer.
A display device comprising:
- a display area in which a pixel area is defined on a substrate by an intersection of a gate line transferring a gate signal, and a data line transferring a data signal, the pixel area comprising a pixel electrode;
- a first pad unit including at least two first pads formed in a first area of the display area, each of the at least two first pads connected to the gate line;
- and
- a second pad unit including at least two second pads formed in a second area of the display area, each of the at least two second pads connected to the data line,
- wherein at least one of the first and second pad units includes a pad electrode formed of a same material as the pixel electrode, and
- wherein an oxide semiconductor layer is formed over an area of the substrate laterally between the at least two first pads or the at least two second pads.
A method of fabricating a pad of a display device, the pad to connect a gate line and a data line from one or more drivers to display elements in a pixel area of the display device, the method comprising:
- forming an oxide semiconductor layer over a substrate;
- forming a lower insulation layer on the oxide semiconductor layer to at least partially overlap the oxide semiconductor layer;
- forming one or more line layers on the lower insulation layer;
- forming an upper insulation layer on the one or more line layer;
- forming a contact hole through the upper insulation layer;
- and
- forming a pad electrode on the upper insulation layer so that the pad electrode is connected to one of the one or more line layers through the contact hole.
A display device comprising:
- a substrate;
- a buffer layer formed over the substrate;
- a plurality of pixel layers formed in a pixel area over a first portion of the buffer layer, the plurality of pixel layers including:
- an active layer formed on the buffer layer in the pixel area;
- a gate insulation layer formed on the active layer in the pixel area;
- an interlayer dielectric layer formed on a gate line in the pixel area;
- a source/drain layer connected with a data line formed on the interlayer dielectric layer in the pixel area;
- a planarization layer formed on the source/drain layer in the pixel area;
- and
- a pixel electrode formed on the planarization layer in the pixel area;
- a plurality of pad layers formed in a pad area over a second portion of the buffer layer, the plurality of pad layers including:
- an oxide semiconductor layer formed on the buffer layer in the pad area, the oxide semiconductor layer formed of a same material as the active layer;
- a data line layer formed over the oxide semiconductor layer in the pad area, the data line layer formed of a same material as the data line;
- an upper insulation layer formed over the data line layer in the pad area, the upper insulation layer formed of a same material as the planarization layer;
- and
- a pad electrode formed on the third insulation layer in the pad area, the pad electrode formed of a same material as the pixel electrode.
Dependencies are inferred from the claim text.