Pattern measuring apparatus and computer program
AssigneeHitachi High-Technologies Corporation
InventorsYuzuru Mochizuki, Maki Tanaka, Miki Isawa, Satoru Yamaguchi
Life of this patent
Estimating the term…
Loading patent…
AssigneeHitachi High-Technologies Corporation
InventorsYuzuru Mochizuki, Maki Tanaka, Miki Isawa, Satoru Yamaguchi
Estimating the term…
Provided are a pattern measuring apparatus and a computer program which determine whether a gap formed in a sample (201) is a core gap (211) or a spacer gap (212). The secondary electron profile of the sample (201) is acquired, the feature quantities of the secondary electron profile at the positions of edges (303, 305) are detected, and based on the detected feature quantities, whether each gap adjacent to each of the edges (303, 305) is the core gap (211) or the spacer gap (212) is determined. Furthermore, the waveform profile of the spacer (207) is previously stored, the secondary electron profile of the sample (201) is acquired, a matching degree of the secondary electron profile and the stored waveform profile at the position of each spacer (207) is detected, and based on the detected matching degree, whether the each gap adjacent to each spacer (207) is the core gap (211) or the spacer gap (212) is determined.
A pattern measuring apparatus for measuring a pattern of a sample, in which plural patterns are arranged, by the use of a signal obtained based on scanning of a charged particle beam relative to the sample, said pattern measuring apparatus comprising:
A computer program stored on a non-transitory computer readable medium for use with a computer connected with a charged particle beam instrument for measuring a pattern of a sample which plural patterns are arranged, based on a signal obtained by scanning the charged particle beam over the sample and for causing the computer to discern types of portions on the sample from the signal,
A pattern measuring apparatus for measuring a pattern of a sample, in which plural patterns are arranged, by the use of a signal obtained based on scanning of a charged particle beam relative to the sample, said pattern measuring apparatus comprising:
Dependencies are inferred from the claim text.