Methods of fabricating nano-scale structures and nano-scale structures fabricated thereby

A method of fabricating a nano-scale structure, the method comprising:

• providing a first hard mask pattern defining lower portions of first openings, first guide elements disposed on the first hard mask pattern and aligned with the lower portions of the first openings, and second hard mask patterns corresponding to isolated patterns;
• forming a blocking layer covering the second hard mask patterns;
• forming a block co-polymer layer filling the first openings and a space between the first guide elements;
• and
• phase-separating the block co-polymer layer to form a first domain and second domains in the space between the first guide elements.

A method of fabricating a nano-scale structure, the method comprising:

• providing a first hard mask pattern defining lower portions of first openings in a dense region;
• providing first guide elements on the first hard mask pattern, the first guide elements defining upper portions of the lower portions of the first openings;
• providing second hard mask patterns in a sparse region, each second hard mask pattern corresponding to an isolated pattern;
• forming a blocking layer covering the second hard mask patterns in the sparse region;
• and
• forming a first domain and second domains in the dense region using a phase separation of a block co-polymer layer.