Organic EL element

A manufacturing method for an organic EL element, comprising:

• preparing an anode;
• forming a tungsten oxide layer above the anode by introducing a gas comprising an argon gas and an oxygen gas to a chamber of a sputtering device, a total pressure of the gas in the chamber being greater than approximately 2.7 pascals and at most equal to approximately 7.0 pascals, a partial pressure ratio of the oxygen gas with respect to the total pressure of the gas in the chamber being at least approximately 50% and at most approximately 70%, and an input power density per unit surface area of a sputtering target being at least approximately 1 W/cm2 and at most approximately 2.8 W/cm2;
• forming a bank material layer containing material constituting a bank above the tungsten oxide layer;
• forming a recess by removing a portion of the bank material layer so that the tungsten oxide layer is partially exposed and an upper surface of the tungsten oxide layer in the recess is closer to the anode than an upper peripheral edge of the recess, the recess having an inner bottom surface and an inner side surface that is continuous with the inner bottom surface;
• heat-treating a remaining portion of the bank material layer, the remaining portion of the bank material layer being made fluid so that the bank material layer extends to cover the upper peripheral edge of the recess,
• forming functional layers including a light-emitting layer above an exposed surface of the tungsten oxide layer after the heat treatment;
• and
• forming a cathode above the functional layer.