# US 8,999,442 B2 · Ruthenium film-forming material and ruthenium film-forming method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 8,999,442 B2 - Document ID: US8999442B2 - Status: Granted - Kind: B2 - Application number: 13/503,899 - Filed: 2010-10-20 - Published: 2012-11-08 - Granted: 2015-04-07 - Earliest claimed: 2009-10-29 - Assignees: Jsr Corporation - Applicants: Ryuichi Saito; Kang-go Chung; Hideki Nishimura; Tatsuya Sakai - Inventors: Ryuichi Saito; Kang-go Chung; Hideki Nishimura; Tatsuya Sakai - Web page: https://patentgrep.com/patent/US8999442B2 ## CPC - C23C 16/18: from metallo-organic compounds - C07C 49/92: Ketonic chelates - C07F 15/0046: {Ruthenium compounds} - H10D 1/694: {comprising noble metals or noble metal oxides} - H10W 20/033: {in openings in dielectrics} - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) - C07C: ACYCLIC OR CARBOCYCLIC COMPOUNDS - C07F: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM (metal-containing porphyrins C07D487/22) - H10D: INORGANIC ELECTRIC SEMICONDUCTOR DEVICES - H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10 ## Abstract Disclosed is a ruthenium film-forming material having a lower melting point and a higher vapor pressure that facilitates supply of the material onto a base and moreover enables a high-quality ruthenium film to be obtained. A ruthenium film-forming material includes a compound represented by general formula (1) below (wherein R1 is independently at each occurrence a hydrogen atom, a halogen atom, a hydrocarbon group having 1 to 4 carbon atoms or a halogenated hydrocarbon group having 1 to 4 carbon atoms; R2 is independently at each occurrence a halogenated hydrocarbon group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogenated alkoxy group having 1 to 4 carbon atoms, with the proviso that R1 and R2 are mutually differing groups; R3 is independently at each occurrence a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and L is an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and having at least two double bonds). ## Claims ### Claim 1 A ruthenium film-forming method, comprising: (1) coating onto a base by any one of spincoating, roll coating, curtain coating, dip coating, spraying and a droplet jetting process a ruthenium film-forming material comprising a compound represented by formula (1): wherein: R1 is independently a hydrogen atom, a halogen atom, a hydrocarbon group having 1 to 4 carbon atoms or a halogenated hydrocarbon group having 1 to 4 carbon atoms; R2 is independently a halogenated hydrocarbon group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a halogenated alkoxy group having 1 to 4 carbon atoms, with the proviso that R1 and R2 are mutually differing groups; R3 is independently a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms; and L is an unsaturated hydrocarbon compound having 4 to 10 carbon atoms and having at least two double bonds; and (2) subjecting the ruthenium film-forming material on the base to heat treatment, light treatment, or both. ### Claim 2 (depends on 1) The method of claim 1, wherein R1 is a hydrocarbon group having 1 to 4 carbon atoms and R2 is an alkoxy group having 1 to 4 carbon atoms. ### Claim 3 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by spincoating. ### Claim 4 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by roll coating. ### Claim 5 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by curtain coating. ### Claim 6 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by dip coating. ### Claim 7 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by spraying. ### Claim 8 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material is coated onto the base by a droplet jetting process. ### Claim 9 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material on the base is subjected to heat treatment. ### Claim 10 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material on the base is subjected to light treatment. ### Claim 11 (depends on 1) The method of claim 1, wherein the ruthenium film-forming material on the base is subjected to heat treatment and light treatment.