US 8,999,221 B2Granted

Curable composition for imprints, patterning method and pattern

AssigneeFUJIFILM Corporation

InventorsKunihiko Kodama, Kyouhei Sakita, Hiroyuki Yonezawa

Life of this patent

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Abstract

Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;

Claims9

Dependent claims

A curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;

Dependencies are inferred from the claim text.

Facts

Application: 14/139,971Filed 24 Dec 2013 · continuation in part
Priority: JP 2008-3088383 Dec 2008
Published: US 2014/0121292 A11 May 2014
Granted: 7 Apr 2015
Term ends: Not estimatedThe source records don’t support an estimate.

Classification6 codes

C09D 4/00
Coating compositions
C08F 220/1807
With acrylic or methacrylic acids: c7-acrylate, e.g. heptyl acrylate or benzyl acrylate
C08F 220/1808
With acrylic or methacrylic acids: c8-acrylate, e.g. isooctyl acrylate or 2-ethylhexyl acrylate
C08F 220/1811
With acrylic or methacrylic acids: c10or C11-acrylate, e.g. isodecyl acrylate, isobornyl acrylate or 2-naphthyl acrylate

Family

PCT/JP2009/070576Parent of this continuation-in-part · filed 2 Dec 2009
US 2014/0121292 A1Pre-grant publication · published 1 May 2014
Application13/132,717Parent of this continuation-in-part
US 8,883,065 B2Parent of this continuation-in-part
US 2011/0236595 A1Published application
US 8,999,221 B2This patent

From the US filing history. Foreign family members aren’t listed.

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