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US 8,999,185 B2Granted
Etching or plating process and resist ink
AssigneeSun Chemical Corporation
InventorNigel Anthony Caiger
Life of this patent
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Abstract
The present invention provides a process of etching or plating comprising the steps of: i) ink jet printing an alkali removeable water insoluble hot melt ink jet ink onto a substrate to form a resist image; ii) etching or plating the substrate in an aqueous acid medium; and iv) removing the resist image with an aqueous alkali.
Claims20
A process of etching or plating comprising the steps of:
- i) ink jet printing an alkali removable water insoluble hot melt ink jet ink onto a substrate to form a resist image;
- ii) etching or plating the substrate in an aqueous acid medium;
- and
- iii) removing the resist image with an aqueous alkali
- wherein the ink comprises an alkali soluble resin and at least 30% by weight of an alkali soluble wax which includes an organic acid and
- wherein the ink comprises 95% by weight or more of alkali soluble components.
3 more elements
An alkali removable water insoluble hot melt ink jet ink for use as an etch or deposition resist, wherein the ink comprises an alkali soluble wax and an alkali soluble resin,
- wherein the ink comprises at least 30% by weight of the alkali soluble wax, wherein the alkali soluble wax includes an organic acid and wherein the ink comprises 95% by weight or more of alkali soluble components.
Dependencies are inferred from the claim text.