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US 8,999,105 B2Granted
Small-scale fabrication systems and methods
AssigneePresident and Fellows of Harvard College
InventorsMarko Loncar, Mikhail D. Lukin, Michael J. Burek, Nathalie de Leon, Brendan Shields
Life of this patent
Estimating the term…
Abstract
An etch mask is formed on a substrate. The substrate is positioned in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure; and the substrate is etched in the enclosure, including removing a portion of the substrate to form a structure having at least a portion that is isolated and/or suspended over the substrate.
Claims24
A method comprising:
- forming an etch mask on a substrate;
- etching the substrate through the etch mask from at least a first direction having a first angle relative to a surface of the substrate, including removing a first portion of the substrate;
- positioning the substrate in an enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure;
- and
- etching the substrate in the enclosure through the etch mask from at least a second direction having a second angle, different from the first angle, relative to the surface of the substrate, including removing a second portion of the substrate to form a structure having at least a first portion of the structure suspended over the substrate.
2 more elements
A fabrication system comprising:
- a plasma etch system;
- a conductive enclosure configured to shield an interior of the enclosure from electromagnetic fields exterior to the enclosure;
- and
- a sample holder disposed within the enclosure, the plasma etch system configured to etch a sample positioned on the sample holder from more than two different directions based on a geometry of the enclosure.
1 more element
Dependencies are inferred from the claim text.