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US 8,999,069 B2Granted
Method for producing cleaning water for an electronic material
AssigneeKurita Water Industries Ltd.
InventorsJunichi Ida, Hiroto Tokoshima
Life of this patent
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Abstract
A method for producing cleaning water for an electronic material, includes obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus, dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water. A concentration of dissolved oxygen is in a range of 8 to 50 mg/L, and a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.
Claims3
A method for producing cleaning water for an electronic material, comprising:
- obtaining oxygen gas and argon gas from air with a PSA oxygen concentration apparatus,
- dissolving the oxygen gas and argon gas obtained from the PSA oxygen concentration apparatus in pure water or ultrapure water,
- wherein a concentration of dissolved oxygen is in a range of 8 to 50 mg/L;
- and
- a content of dissolved argon gas is in a range of 2 to 50 volume % of a total amount of dissolved oxygen gas and the dissolved argon gas.
2 more elements
Dependencies are inferred from the claim text.