Susceptor, semiconductor manufacturing apparatus, and semiconductor manufacturing method

A semiconductor manufacturing apparatus comprising:

• a reaction chamber into which a wafer is conveyed;
• a gas supply mechanism configured to supply a process gas into the reaction chamber;
• a gas exhausting mechanism configured to exhaust the process gas from the reaction chamber;
• an inner susceptor having a diameter smaller than a diameter of the wafer, the inner susceptor comprising a first surface and a convex portion formed on the first surface, the convex portion for temporary placement thereon of the wafer;
• and
• an outer susceptor comprising:
• a first step portion having:
• an opening at the center of the first step portion, the opening being blocked by the inner susceptor, and
• a first upper stage;
• and
• a second step portion having a second upper stage, the second step portion being formed above the first upper stage, and the second upper stage receiving the wafer from the convex portion, wherein a void is formed between a to surface of the convex portion and the rear surface of the wafer when the second upper stage receives the wafer;
• a heater configured to heat the wafer from a lower side of the inner susceptor and the outer susceptor;
• a rotating mechanism configured to rotate the wafer;
• and
• a push-up pin configured to penetrate the heater and to vertically move the inner susceptor.