Prevention of particle adders when contacting a liquid meniscus over a substrate
AssigneeLam Research Corporation
InventorsEnrico Magni, Suresh Gupta, Mark Gahagan, Eric Lenz, Mike Ravkin
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AssigneeLam Research Corporation
InventorsEnrico Magni, Suresh Gupta, Mark Gahagan, Eric Lenz, Mike Ravkin
Estimating the term…
A method for meniscus processing a substrate is provided. The method initiates with generating a meniscus spanning at least a length of the substrate. A pre-wetting liquid or vapor is dispensed. A substrate is moved through the dispensed pre-wetting liquid or vapor and the meniscus. The dispensed pre-wetting vapor condenses a pre-wetting liquid over a region of the substrate adjacent to a region of the substrate where the meniscus is generated. The pre-wetting liquid is deposited without substantially generating surface flow of the pre-wetting liquid on the substrate, and the pre-wetting liquid prevents the leading edge of the meniscus from contacting a dry surface region of the substrate.
A system for meniscus processing a substrate, comprising:
A system for meniscus processing a substrate, comprising:
A system for meniscus processing a substrate, comprising:
Dependencies are inferred from the claim text.