Polishing pad

A polishing pad, comprising a polishing layer comprising a polyurethane foam having fine cells,

• the polyurethane foam comprising a cured product of a reaction of an isocyanate-terminated prepolymer (A), an isocyanate-terminated prepolymer (B), and a chain extender,
• the isocyanate-terminated prepolymer (A) comprising isocyanate monomers, a high molecular weight polyol (a), and a low molecular weight polyol,
• the isocyanate-terminated prepolymer (B) comprising a polymerized diisocyanate and a high molecular weight polyol (b),
• wherein the high molecular weight polyol (a) is a polyether polyol with a number average molecular weight of 1000 to 2000, and the isocyanate monomers are toluene diisocyanate and dicyclohexylmethane diisocyanate,
• the high molecular weight polyol (b) is a polyether polyol with a number average molecular weight of 250 to 650, and the polymerized diisocyanate is polymerized hexamethylene diisocyanate of isocyanurate type and/or biuret type, and
• both the high molecular weight polyol (a) and the high molecular weight polyol (b) are polytetramethylene ether glycol.