Method and system to reduce outgassing in a reaction chamber
AssigneeASM IP Holding B.V.
InventorsSung-Hoon Jung, Petri Raisanen, Eric Jen Cheng Liu, Mike Schmotzer
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Abstract
Systems and methods of reducing outgassing of a substance within a reaction chamber of a reactor are disclosed. Exemplary methods include depositing a barrier layer within the reaction chamber and using a scavenging precursor to react with species on a surface of the reaction chamber. Exemplary systems include gas-phase deposition systems, such as atomic layer deposition systems, which include a barrier layer source and/or a scavenging precursor source fluidly coupled to a reaction chamber of the system.
Claims11
A method of reducing outgassing of a substance within a reaction chamber, the method comprising the steps of:
- providing a gas-phase reactor having a reaction chamber;
- depositing material onto a surface of a substrate within the reaction chamber;
- and
- providing a scavenging precursor to the reaction chamber to react with the material on a surface of the reaction chamber that is upstream of the substrate, wherein the scavenging precursor is substantially consumed or is consumed prior to reaching the substrate.
Dependencies are inferred from the claim text.