Method of producing polymeric compound, resist composition, and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsYoshiyuki Utsumi, Takahiro Dazai, Masatoshi Arai, Takaaki Kaiho
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Abstract
A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to generate an acid, the method including: synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group, washing the precursor polymer with water, and subsequently subjecting the precursor polymer to a salt exchange with an organic cation. Also, a polymeric compound produced using the method of producing a polymeric compound, and a method of forming a resist pattern using the resist composition.
Claims4
A method of producing a polymeric compound containing a structural unit that decomposes upon exposure to irradiation with radiation to generate an acid, the method comprising:
- synthesizing a precursor polymer by polymerizing a water-soluble monomer having an anionic group which is at least one group selected from the group consisting of groups represented by general formulas (a5-an1) and (a5-an2) shown below:
- wherein each of Rf1 and Rf2 independently represents a hydrogen atom, an alkyl group, a fluorine atom or a fluorinated alkyl group, provided that at least one of Rf1 and Rf2 represents a fluorine atom or a fluorinated alkyl group, p represents an integer of 1 to 8, each of Z1 and Z2 independently represents —C(═O)— or —SO2—, and R61 represents a hydrocarbon group which may have a fluorine atom;
- washing the precursor polymer with water;
- and subsequently
- subjecting the precursor polymer to a salt exchange with an organic cation.
Dependencies are inferred from the claim text.