Semiconductor photocatalyst coated with graphitic carbon film and method of fabricating the same

A method of fabricating a semiconductor photocatalyst coated with a plurality of carbon films, comprising:

• a first step of preparing a semiconductor photocatalyst to be coated with a plurality of carbon films;
• a second step of introducing the semiconductor photocatalyst into a glucose aqueous solution and heat treating to form a gel phase containing glucose onto a surface of the semiconductor photocatalyst;
• and
• a third step of heat treating the resultant of the second step to form the semiconductor photocatalyst coated with the plurality of carbon films,
• wherein the semiconductor photocatalyst with the gel phase containing glucose formed thereof is dried at 60° C. to 70° C. for 12 or 24 hours in a vacuum oven to remove water remaining in the glucose, and
• wherein the plurality of carbon films spaced apart from each other are coated on the surface of the semiconductor photocatalyst.