Methods of forming nanoparticles using semiconductor manufacturing infrastructure

A method, comprising:

• forming by optical lithography, using a positive tone resist and positive tone development, a patterned template on a substrate, wherein the template is insoluble in a particular organic solvent but soluble in a given aqueous and/or organic solution;
• casting a formulation onto the patterned template, the formulation including material in the organic solvent;
• removing the organic solvent, thereby leaving behind nanoparticles in contact with the template;
• optionally treating the nanoparticles photochemically, thermally, and/or chemically;
• using the solution to remove both the template and the nanoparticles;
• and
• isolating the nanoparticles from the template.

A method, comprising:

• forming by optical lithography, using a positive tone resist and positive tone development, a patterned template on a substrate, wherein the template is insoluble in a particular organic solvent but soluble in a given aqueous and/or organic solution;
• casting a formulation onto the patterned template, the formulation including material in the organic solvent, removing the organic solvent, thereby leaving behind nanoparticles in contact with the template;
• optionally treating the nanoparticles photochemically, thermally, and/or chemically;
• removing the template using the solution, while leaving most of the nanoparticles behind on the substrate;
• and
• removing the nanoparticles from the substrate.