HDD patterning using flowable CVD film

A method of forming a patterned magnetic substrate, comprising:

• forming a patterned resist having thick portions and thin portions on a magnetically active surface of a substrate;
• forming an oxide layer over the patterned resist by a process, comprising:
• reacting a silicon containing precursor with an oxygen precursor to form a flowable oxide layer;
• and
• curing the flowable oxide layer at a temperature that is less than about 150° C. to form the oxide layer;
• exposing portions of the patterned resist by etching the oxide layer to form an etched oxide layer having openings;
• exposing portions of the magnetically active surface by etching the patterned resist using the etched oxide layer as a mask to form an etched resist layer having openings;
• modifying a magnetic property of the exposed portions of the magnetically active surface by directing energy through the openings of the etched resist layer and the openings of the etched oxide layer;
• and
• removing the etched resist layer and the etched oxide layer from the substrate.