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US 8,986,488 B2Granted
Pattern formation method and polymer alloy base material
AssigneeKabushiki Kaisha Toshiba
InventorsShigeki Hattori, Koji Asakawa, Hiroko Nakamura, Ryota Kitagawa, Yuriko Seino, Masahiro Kanno, Momoka Higa
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Abstract
According to one embodiment, a pattern formation method is provided, the pattern formation includes: laminating a self-assembled monolayer and a polymer film on a substrate; causing chemical bonding between the polymer film and the self-assembled monolayer by irradiation with an energy beam to form a polymer surface layer on the self-assembled monolayer; and forming on the polymer surface layer a polymer alloy having a pattern of phase-separated structures.
Claims13
A pattern formation method comprising:
- laminating a self-assembled monolayer and a polymer film on a substrate;
- causing chemical bonding between the polymer film and the self-assembled monolayer by irradiation with an energy beam to thereby form a polymer surface layer on the self-assembled monolayer;
- and
- forming on the polymer surface layer a polymer alloy having a pattern of phase-separated structures.
1 more element
Dependencies are inferred from the claim text.