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US 8,985,935 B2Granted
Mass damper for semiconductor wafer handling end effector
AssigneeNovellus Systems, Inc.
InventorsMark K. Tan, Nicholas M. Kopec, Richard M. Blank
Life of this patent
Estimating the term…
Abstract
A calibrated mass damper for use with end effectors for semiconductor wafer handling robots is described. The calibrated mass damper reduces vibrational response in an end effector carrying a semiconductor wafer without requiring modification of the end effector structure.
Claims19
A device comprising:
- a mechanical interface configured to rigidly connect to an end effector of a wafer handling robot, the end effector:
- having an interface portion configured to connect the end effector to the wafer handling robot,
- having a thin finger extending away from the interface portion, and
- configured to support a wafer such that the finger is disposed underneath the wafer;
- and
- a calibrated mass damper (CMD), wherein:
- the mechanical interface is configured to attach the CMD to a tip of the finger opposite the interface portion,
- the CMD is greater than or equal to one-half pound-mass, and
- the CMD is calibrated to produce at least one octave of separation between a first modal frequency of the end effector and a first modal frequency of the wafer that the end effector is configured to support.
6 more elements
An end effector retrofit kit, the end effector retrofit kit comprising:
- a calibrated mass damper (CMD), wherein:
- the CMD includes a mechanical interface configured to rigidly connect to an end effector of a wafer handling robot, the end effector:
- having an interface portion configured to connect the end effector to the wafer handling robot,
- having a thin finger extending away from the interface portion, and
- configured to support a wafer such that the finger is disposed underneath the wafer, wherein the finger has a tip portion located on an opposite end of the finger from the interface portion and the mechanical interface portion of the CMD is configured to rigidly connect to the end effector by connecting to the tip portion;
- the CMD is greater than or equal to one-half pound-mass;
- and
- the CMD is calibrated to produce at least one octave of separation between a first modal frequency of the end effector and a first modal frequency of the wafer that the end effector is configured to support.
5 more elements
An end effector, the end effector comprising:
- a mechanical interface portion, a first side of the mechanical interface portion configured to rigidly connect to an arm of a wafer handling robot;
- a finger portion, the finger portion extending from the mechanical interface portion in a direction generally opposed to the first side;
- a tip, the tip located at an end of the finger portion opposite the mechanical interface portion, wherein the end effector is configured to support a semiconductor wafer during wafer transfer operations such that the finger portion is disposed underneath the wafer;
- and
- a calibrated mass damper (CMD), wherein:
- the CMD is proximate to the tip,
- the CMD is greater than or equal to one-half pound-mass, and
- the CMD is calibrated to produce at least one octave of separation between a first modal frequency of the end effector and a first modal frequency of the semiconductor wafer.
5 more elements
Dependencies are inferred from the claim text.