Wafer carrier track
AssigneeAlta Devices, Inc.
InventorsGang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
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AssigneeAlta Devices, Inc.
InventorsGang He, Gregg Higashi, Khurshed Sorabji, Roger Hamamjy, Andreas G. Hegedus
Estimating the term…
Embodiments of the invention generally relate to apparatuses for chemical vapor deposition (CVD) processes. In one embodiment, a wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system is provided which includes upper and lower sections of a track assembly having a gas cavity formed therebetween. A guide path extends along an upper surface of the upper section and between two side surfaces which extend along and above the guide path and parallel to each other. A plurality of gas holes along the guide path extends from the upper surface of the upper section, through the upper section, and into the gas cavity. In some examples, the upper and lower sections of the track assembly may independently contain quartz, and in some examples, may be fused together.
A wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system, comprising:
A wafer carrier track for levitating and traversing a wafer carrier within a vapor deposition reactor system, comprising:
Dependencies are inferred from the claim text.