Photosensitive resin composition, method for producing structure, and liquid discharge head

A method for producing a structure, the method comprising in this order:

• providing a substrate provided with a layer of a photosensitive resin composition for forming a structure, the photosensitive resin composition comprising:
• (a) a compound polymerizable in the presence of an acid;
• (b) a photoacid generating agent comprising an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below;
• and
• (c) a compound capable of deactivating an acid produced from the component (b) after exposure to light,
• wherein the component (b) absorbs at least 50% of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
• wherein R1 to R3 each independently represent an organic group of 1 to 30 carbon atoms, R1 to R3 represent structures containing at least two oxygen atoms and comprising at least one organic group selected from a thioxanthone skeleton, a 9,10-dialkoxyanthracene skeleton, or an anthraquinone skeleton, X is selected from a carbon atom, a nitrogen atom, a phosphorus atom, a boron atom, and an antimony atom, Y is at least one selected from —S(═O)2—, —CF2—O—, —CF2—C(═O)—, —CF2—C(═O)—O—, and —CF2—O—C(═O)—, or X and R4 are directly bonded to each other, R4 represents a hydrocarbon group of 1 to 30 carbon atoms, provided that when Y represents —S(═O)2— or a single bond, the hydrocarbon group represented by R4 has at least one fluorine atom, and when X represents a carbon atom, m and n represent integers that satisfy m+n=3 and n=0 to 2, when X represents a nitrogen atom, m and n represent integers that satisfy m+n=2 and n=0 to 1, when X represents a phosphorus or antimony atom, m and n represent integers that satisfy m+n=6 and n=0 to 6, or when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0 to 3;
• exposing the layer to light, then curing the exposed part and removing the uncured part;
• and
• heating the cured part at a temperature of at least 140 degrees Celsius to form a structure.

A liquid discharge head comprising:

• a discharge port member having a discharge port configured to discharge a liquid,
• wherein the discharge port member is made of a product of curing of a photosensitive resin composition comprising:
• (a) a compound polymerizable in the presence of an acid;
• and
• (b) a photoacid generating agent comprising an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below,
• wherein the component (b) absorbs at least 50% of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
• wherein R1 to R3 each independently represent an organic group of 1 to 30 carbon atoms, R1 to R3 represent structures containing at least two oxygen atoms and comprising at least one organic group selected from a thioxanthone skeleton, a 9,10-dialkoxyanthracene skeleton, or an anthraquinone skeleton, X is selected from a carbon atom, a nitrogen atom, a phosphorus atom, a boron atom, and an antimony atom, Y is at least one selected from —S(═O)2—, —CF2—O—, —CF2—C(═O)—, —CF2—C(═O)—O—, and —CF2—O—C(═O)—, or X and R4 are directly bonded to each other, R4 represents a hydrocarbon group of 1 to 30 carbon atoms, provided that when Y represents —S(═O)2— or a single bond, the hydrocarbon group represented by R4 has at least one fluorine atom, and when X represents a carbon atom, m and n represent integers that satisfy m+n=3 and n=0 to 2, when X represents a nitrogen atom, m and n represent integers that satisfy m+n=2 and n=0 to 1, when X represents a phosphorus or antimony atom, m and n represent integers that satisfy m+n=6 and n=0 to 6, or when X represents a boron atom, m and n represent integers that satisfy m+n=4 and n=0 to 3.