Arrays of metal and metal oxide microplasma devices with defect free oxide
AssigneeThe Board of Trustees of the University of Illinois
InventorsJ. Gary Eden, Sung-Jin Park, Jin Hoon Cho, Seung Hoon Sung, Min Hwan Kim
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Abstract
A microplasma device of the invention includes a microcavity or microchannel defined at least partially within a thick metal oxide layer consisting essentially of defect free oxide. Electrodes are arranged with respect to the microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage and at least one of the electrodes is encapsulated within the thick metal oxide layer. Large arrays can be formed and are highly robust as lack of microcracks in the oxide avoid dielectric breakdown.
Claims13
A microplasma device, comprising:
- a microcavity (16) or microchannel (21, 30) defined at least partially within a thick metal oxide layer (10) consisting essentially of defect free oxide being essentially free of microcracking;
- and
- electrodes (12, 22a, 22b) arranged with respect to said microcavity or microchannel to stimulate plasma generation in said microcavity or microchannel upon application of suitable voltage wherein at least one of said electrodes is encapsulated within said thick metal oxide layer, wherein said thick metal oxide layer consists of nanopores that are perpendicular to a primary plane of said at least one of said electrodes and is at least tens of microns thick.
Dependencies are inferred from the claim text.