Recording medium recording program for generating mask data, method for manufacturing mask, and exposure method

A method for determining data of a mask and an exposure condition used in an exposure apparatus that exposes a substrate using a projection optical system for projecting an image of a pattern of the mask onto the substrate, wherein

• the mask includes a main pattern for resolving a target pattern to be formed on the substrate and an auxiliary pattern for assisting the main pattern to resolve, and
• the method comprising the following steps executed by a processor:
• setting a main value of a parameter of the main pattern and an auxiliary value of a parameter of the auxiliary pattern;
• setting a light intensity value of a parameter of a light intensity distribution on a pupil plane of an illumination optical system for illuminating the mask;
• calculating an image of the main pattern that is formed if the main pattern and the auxiliary pattern determined by the main and auxiliary values respectively, are projected by using the projection optical system under the light intensity distribution determined by the light intensity value;
• evaluating the calculated image of the main pattern changing the main value, the auxiliary value and the light intensity value based on an evaluation result of the calculated image of the main pattern;
• repeating a step of changing the main value, the auxiliary value and the light intensity value based on an evaluation result of the calculated image, the step of calculating the image of the main pattern using the changed main value, the changed auxiliary value and the changed light intensity value the step of evaluating the calculated image of the main pattern, and the step of changing the main value, the auxiliary value and the light intensity value based on an evaluation result of the calculated image of the main pattern;
• and
• determining the main pattern, the auxiliary pattern and the light intensity distribution based on the evaluation results of repeating the steps.