Surface inspecting apparatus and method for calibrating same
AssigneeHitachi High-Technologies Corporation
InventorsKenji Oka, Kenji Mitomo, Kenichiro Komeda
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AssigneeHitachi High-Technologies Corporation
InventorsKenji Oka, Kenji Mitomo, Kenichiro Komeda
Estimating the term…
While an illumination optical system is irradiating the surface of a contaminated standard wafer with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer, then detectors of a detection optical system each detect the light scattered from the surface of the contaminated standard wafer, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes of the detectors, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed. This makes is easy to calibrate the detection sensitivity.
A surface inspecting apparatus comprising:
A method for calibrating a surface inspecting apparatus that includes a light unit that irradiates with illumination light a surface of a body to be inspected, a scanner that scans the light irradiated from the light unit over the surface of the to-be-inspected body, and at least one detector that detects the light scattered from the surface of the body to be inspected, the method comprising the steps of:
Dependencies are inferred from the claim text.