Aspheric surface measuring method, aspheric surface measuring apparatus, optical element producing apparatus and optical element

An aspheric surface measuring method for measuring profile of a measurement object aspheric surface by using output from a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through an optical system, the method comprising:

• a step of providing a reference aspheric surface whose profile has been measured;
• a step of measuring a first wavefront of a reference light, which is projected onto and reflected by the reference aspheric surface and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a step of calculating a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter change step of changing a parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• a step of measuring a first ray angle distribution that is an angle distribution of rays of the reference light by using the output from the light-receiving sensor;
• a step of measuring a second ray angle distribution that is an angle distribution of rays of the measurement light by using the output from the light-receiving sensor;
• a step of performing ray tracing calculation of the rays of the reference light by using the changed parameter, the first ray angle distribution and the second ray angle distribution to calculate intersection points of the rays of the reference light with the reference aspheric surface and ray angles thereof at the intersection points;
• and
• a step of calculating the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the intersection points and the ray angles thereat.

An aspheric surface measuring apparatus configured to measure profile of a measurement object aspheric surface, the apparatus comprising:

• an optical system;
• a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through the optical system;
• a wavefront measuring device configured to measure a first wavefront of a reference light, which is projected onto and reflected by a reference aspheric surface whose profile has been measured and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a wavefront calculating device configured to calculate a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter changing device configured to change the parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• and
• a profile calculating device configured to calculate the profile of the measurement object aspheric surface,
• wherein the profile calculating device is configured to:
• calculate, by using the parameter changed by the parameter changing device, at least one magnification distribution of (a) a positional magnification distribution showing a positional relationship of rays of the reference light between positions on the light-receiving sensor and on a sensor conjugate surface having a conjugate relationship with the light-receiving sensor provided by the optical system and (b) an angular magnification distribution showing an angular relationship of the rays of the reference light between angles on the light-receiving sensor and on the sensor conjugate surface;
• measure, by using the output from the light-receiving sensor, (a) a first ray angle distribution that is an angle distribution of the rays of the reference light and (b) a second ray angle distribution that is an angle distribution of rays of the measurement light;
• and
• calculate the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the first ray angle distribution, the second ray angle distribution and the at least one magnification distribution.

An aspheric surface measuring apparatus configured to measure profile of a measurement object aspheric surface, the apparatus comprising:

• an optical system;
• a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through the optical system;
• a wavefront measuring device configured to measure a first wavefront of a reference light, which is projected onto and reflected by a reference aspheric surface whose profile has been measured and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a wavefront calculating device configured to calculate a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter changing device configured to change the parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• and
• a profile calculating device configured to calculate the profile of the measurement object aspheric surface,
• wherein the profile calculating device is configured to:
• measure, by using the output from the light-receiving sensor, (a) a first ray angle distribution that is an angle distribution of rays of the reference light reflected by the reference aspheric surface and (b) a second ray angle distribution that is an angle distribution of rays of the measurement light;
• perform ray tracing calculation of the rays of the reference light by using the changed parameter, the first ray angle distribution and the second ray angle distribution to calculate intersection points of the rays of the reference light with the reference aspheric surface and ray angles thereof at the intersection points;
• and
• calculate the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the intersection points and the ray angles thereat.

An optical element producing apparatus comprising:

• a shaping apparatus configured to shape an optical element;
• and
• a measuring apparatus configured to measure profile of a measurement object aspheric surface of the optical element by an aspheric surface measuring method using output from a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through an optical system, the method comprising:
• a step of providing a reference aspheric surface whose profile has been measured;
• a step of measuring a first wavefront of a reference light, which is projected onto and reflected by the reference aspheric surface and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a step of calculating a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter change step of changing the parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• a step of calculating, by using the changed parameter, at least one magnification distribution of (a) a positional magnification distribution showing a positional relationship of rays of the reference light between positions on the light-receiving sensor and on a sensor conjugate surface having a conjugate relationship with the light-receiving sensor provided by the optical system and (b) an angular magnification distribution showing an angular relationship of the rays of the reference light between angles on the light-receiving sensor and on the sensor conjugate surface;
• a step of measuring a first ray angle distribution that is an angle distribution of the rays of the reference light by using the output from the light-receiving sensor;
• a step of measuring a second ray angle distribution that is an angle distribution of rays of the measurement light by using the output from the light-receiving sensor;
• and
• a step of calculating the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the first ray angle distribution, the second ray angle distribution and the at least one magnification distribution.

An optical element producing apparatus comprising:

• a shaping apparatus configured to shape an optical element;
• and
• a measuring apparatus configured to measure profile of a measurement object aspheric surface of the optical element by an aspheric surface measuring method using output from a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through an optical system, the method comprising:
• a step of providing a reference aspheric surface whose profile has been measured;
• a step of measuring a first wavefront of a reference light, which is projected onto and reflected by the reference aspheric surface and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a step of calculating a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter change step of changing a parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• a step of measuring a first ray angle distribution that is an angle distribution of rays of the reference light by using the output from the light-receiving sensor;
• a step of measuring a second ray angle distribution that is an angle distribution of rays of the measurement light by using the output from the light-receiving sensor;
• a step of performing ray tracing calculation of the rays of the reference light by using the changed parameter, the first ray angle distribution and the second ray angle distribution to calculate intersection points of the rays of the reference light with the reference aspheric surface and ray angles thereof at the intersection points;
• and
• a step of calculating the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the intersection points and the ray angles thereat.

An optical element comprising:

• a body of the optical element;
• and
• an aspheric surface formed on the body,
• wherein the optical element is produced by using an optical element producing apparatus including a shaping apparatus configured to shape an optical element, and a measuring apparatus configured to measure a profile of a measurement object aspheric surface of the optical element by an aspheric surface measuring method using output from a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through an optical system, and
• wherein
• a step of providing a reference aspheric surface whose profile has been measured;
• a step of measuring a first wavefront of a reference light, which is projected onto and reflected by the reference aspheric surface and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a step of calculating a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter change step of changing the parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• a step of calculating, by using the changed parameter, at least one magnification distribution of (a) a positional magnification distribution showing a positional relationship of rays of the reference light between positions on the light-receiving sensor and on a sensor conjugate surface having a conjugate relationship with the light-receiving sensor provided by the optical system and (b) an angular magnification distribution showing an angular relationship of the rays of the reference light between angles on the light-receiving sensor and on the sensor conjugate surface;
• a step of measuring a first ray angle distribution that is an angle distribution of the rays of the reference light by using the output from the light-receiving sensor;
• a step of measuring a second ray angle distribution that is an angle distribution of rays of the measurement light by using the output from the light-receiving sensor;
• and
• a step of calculating the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the first ray angle distribution, the second ray angle distribution and the at least one magnification distribution.

An optical element comprising:

• a body of the optical element;
• and
• an aspheric surface formed on the body,
• wherein the optical element is produced by using an optical element producing apparatus including a shaping apparatus configured to shape an optical element, and a measuring apparatus configured to measure a profile of a measurement object aspheric surface of the optical element by an aspheric surface measuring method using output from a light-receiving sensor to which a measurement light projected onto and reflected by the measurement object aspheric surface is introduced through an optical system, the method comprising:
• a step of providing a reference aspheric surface whose profile has been measured;
• a step of measuring a first wavefront of a reference light, which is projected onto and reflected by the reference aspheric surface and is introduced to the light-receiving sensor through the optical system, on the light-receiving sensor by using the output from the light-receiving sensor;
• a step of calculating a second wavefront of the reference light on the light-receiving sensor by using a parameter of the optical system;
• a parameter change step of changing a parameter of the optical system in calculation such that a difference between rotationally symmetric components of the first and second wavefronts becomes smaller than before the change of the parameter;
• a step of measuring a first ray angle distribution that is an angle distribution of rays of the reference light by using the output from the light-receiving sensor;
• a step of measuring a second ray angle distribution that is an angle distribution of rays of the measurement light by using the output from the light-receiving sensor;
• a step of performing ray tracing calculation of the rays of the reference light by using the changed parameter, the first ray angle distribution and the second ray angle distribution to calculate intersection points of the rays of the reference light with the reference aspheric surface and ray angles thereof at the intersection points;
• and
• a step of calculating the profile of the measurement object aspheric surface by using the profile of the reference aspheric surface, the intersection points and the ray angles thereat.