Illumination optical system, exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorsHirohisa Tanaka, Yasushi Mizuno
Life of this patent
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AssigneeNikon Corporation
InventorsHirohisa Tanaka, Yasushi Mizuno
Estimating the term…
According to one embodiment, an illumination optical system is provided with an optical integrator which forms a predetermined light intensity distribution on an illumination pupil plane in an illumination optical path of the illumination optical system with incidence of exposure light from a light source device thereinto; a transmission filter arranged on the reticle side with respect to the optical integrator and in a first adjustment region set including the illumination pupil plane in an optical-axis direction of the illumination optical system, and having a transmittance characteristic varying according to positions of the exposure light incident thereinto; and a movement mechanism which moves the transmission filter along the optical-axis direction in the first adjustment region.
An illumination optical system for illuminating an illumination target surface with light from a light source, comprising:
An illumination optical system for illuminating an illumination target surface with light from a light source, comprising:
An illumination optical system for illuminating an illumination target surface with light from a light source, comprising:
An illumination method for illuminating an illumination target surface with light from a light source, comprising:
An illumination method for illuminating an illumination target surface with light from a light source, comprising:
An illumination method for illuminating an illumination target surface with light from a light source, comprising:
Dependencies are inferred from the claim text.