Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsKoen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
Life of this patent
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Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Claims25
An apparatus, comprising:
- a substrate table arranged to hold a substrate during exposure in an immersion lithographic apparatus;
- and
- a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure, the cover plate configured to provide a surface, facing a projection system of the immersion lithographic apparatus, that is adjacent to and substantially level with the substrate, wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface.
A device manufacturing method, comprising:
- projecting a modulated radiation beam, through a liquid, onto a substrate held on a substrate table, the substrate table having a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure, and the cover plate providing a surface that is adjacent to and substantially level with a surface of the substrate onto which the modulated radiation beam is incident;
- and
- reducing a heat transfer to or from the cover plate using a reflective surface of the cover plate, of a surface of the substrate table under the cover plate, or both.
An apparatus, comprising:
- a substrate table to hold a substrate;
- a projection system to project a modulated radiation beam onto the substrate;
- a liquid supply system to provide a liquid in a region between the projection system and the substrate table during exposure;
- and
- a cover plate physically separate and removable from the substrate table, the cover plate positioned on top of a surface of the substrate table during exposure and providing a surface facing the projection system that is substantially level with and adjacent to the substrate when supported by the substrate table;
- a thermal insulator to reduce heat transfer to or from the cover plate,
- wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface.
An apparatus, comprising:
- a substrate table arranged to hold a substrate;
- a projection system to project a modulated radiation beam onto the substrate;
- a liquid supply system to provide a liquid in a region between the projection system and the substrate table;
- a cover plate physically separate and removable from the substrate table, the cover plate positioned outward of the substrate during exposure and the cover plate configured to provide a substantially horizontal surface adjacent to the substrate, wherein the cover plate, a surface of the substrate table under the cover plate, or both, has a reflective surface;
- and
- a plurality of protrusions of the substrate table to support the cover plate.
An apparatus, comprising:
- a movable table supporting an object;
- a projection system to project a modulated radiation beam onto a substrate;
- a liquid supply system to provide a liquid in a region between the projection system and the table;
- a cover plate physically separate from the substrate table, the cover plate positioned on top of a surface of the table and outward of the object during exposure, the cover plate configured to provide a substantially horizontal surface at least partly surrounding the object and having a reflective surface;
- and
- a plurality of protrusions of the table to support the cover plate thereon.
Dependencies are inferred from the claim text.