Radiation source, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsErik Roelof Loopstra, Gerardus Hubertus Petrus Maria Swinkels, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors
Life of this patent
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Abstract
A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
Claims20
A radiation source configured to produce extreme ultraviolet radiation, the radiation source comprising:
- a chamber in which, in use, a plasma is generated to provide the radiation;
- a heating system configured to maintain an evaporation surface at a temperature to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface;
- and
- a vessel having an inner wall and an outer wall, the inner wall comprising the evaporation surface, and the outer wall has a higher emissivity than the inner wall.
A radiation source configured to produce extreme ultraviolet radiation, the radiation source comprising:
- a chamber in which, in use, a plasma is generated to provide the radiation;
- a vessel structure within the chamber, the structure configured to receive the radiation in its interior;
- a gas injector arranged to inject a gas flow in the chamber at an edge of the structure;
- and
- an outlet to draw injected gas flow from the edge of the structure towards an interior of the structure.
A radiation source configured to produce extreme ultraviolet radiation, the radiation source comprising:
- a chamber in which, in use, a plasma is generated to provide the radiation;
- and
- an outlet conduit to remove debris from the plasma, the outlet conduit having a cooling structure to condense the debris from a gas flow in the outlet conduit.
Dependencies are inferred from the claim text.