Electron beam interference device and electron beam interferometry

An electron beam interferometry including,

• a light source of an electron beam;
• an irradiation optical system for irradiating an electron beam emitted from the light source to a specimen;
• an imaging lens system having an objective lens that images an image of the specimen;
• an electron biprism disposed on an optical axis of the electron beam;
• an image recording device recording a plurality of interference images in the specimen;
• and
• an image operation processing device operating the phase distribution images of the specimen,
• the electron beam interferometry comprising:
• a first step of recording a first interference image based on a first observation region that an electron beam through which interferes with an electron beam transmitted through a reference wave region by the electron biprism is transmitted and the electron beam transmitted through the reference wave region;
• a second step of recording a second interference image based on a first observation region that an electron beam through which interferes with an electron beam transmitted through the second observation region by the electron biprism is transmitted, and the electron beam transmitted through the first observation region;
• and
• a third step of operating phase distribution images of the electron beam transmitted through the reference wave region and the electron beam transmitted through the second observation region based on the second interference image and the first interference image.

An electron beam interferometry including,

• a light source of an electron beam;
• an irradiation optical system for irradiating an electron beam emitted from the light source to a specimen;
• an imaging lens system having an objective lens that images an image of the specimen;
• an electron biprism disposed on an optical axis of the electron beam;
• an image recording device recording a plurality of interference images in the specimen;
• and
• an image operation processing device operating the phase distribution images of the specimen,
• the electron beam interferometry comprising:
• a first step of recording a first interference image based on a first observation region that an electron beam through which interferes with an electron beam transmitted through a reference wave region by the electron biprism is transmitted and the electron beam transmitted through the reference wave region;
• a second step of recording a second interference image based on an electron beam transmitted through a first observation region that an electron beam through which interferes with an electron beam transmitted through the second observation region by the electron biprism is transmitted, and the electron beam transmitted through the first observation region;
• a third step of operating first phase distribution images of the electron beam transmitted through the reference wave region and the electron beam transmitted through the first observation region based on the first interference image;
• a fourth step of operating second phase distribution images of the electron beam transmitted through the first observation region and the electron beam transmitted through the second observation region based on the second interference image;
• and
• a fifth step of arranging and displaying the operated first and second phase distribution images in the order in which interference images which become origins of the operated phase distribution images are recorded.