Device for a laser lift-off method and laser lift-off method
AssigneeOSRAM Opto Semiconductors GmbH
InventorRalph Wagner
Life of this patent
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Abstract
A device is intended for a laser lift-off method to sever at least one layer from a carrier. The device includes a laser that generates pulsed laser radiation and at least one beam splitter. The laser radiation is divided into at least two partial beams by the at least one beam splitter. The partial beams are superimposed in an irradiation plane, the irradiation plane being provided such that a major side of the carrier remote from the layer is arranged therein. At the irradiation plane, an angle (α) between the at least two partial beams is at least 1.0°.
Claims12
A device for a laser lift-off method for severing at least one layer from a carrier comprising:
- a laser that generates laser radiation;
- and
- at least one beam splitter;
- wherein
- the laser radiation is divided into at least two partial beams by the at least one beam splitter,
- the at least two partial beams are superimposed in an irradiation plane,
- the laser radiation is pulsed laser radiation and a pulse duration of the laser radiation is at most 50 ns, and an optical path length difference between the partial beams corresponds to at least 0.025 times and at most 0.25 times the pulse duration,
- the irradiation plane is provided such that a major side of the carrier remote from the layer is arranged therein, and
- an angle between the at least two partial beams at the irradiation plane is at least 1.0°.
A laser lift-off method for severing an epitaxially grown semiconductor layer sequence from a carrier, comprising:
- providing a semiconductor layer or the semiconductor layer sequence grown epitaxially on the carrier;
- dividing laser radiation into at least two partial beams;
- and
- superimposing the partial beams in an irradiation plane in which a major side of the carrier remote from the semiconductor layer sequence is located,
- wherein an angle between the at least two partial beams at the irradiation plane is at least 1.0°, the carrier has a thickness of 250 μm to 1.5 μm, and intensity modulation of the superimposed partial beams at a growth side of the carrier facing the semiconductor layer sequence is at most 20%, relative to a local envelope of a beam profile of the superimposed partial beams.
A laser lift-off method for severing an epitaxially grown semiconductor layer sequence from a carrier, comprising:
- providing a semiconductor layer or the semiconductor layer sequence grown epitaxially on the carrier;
- dividing laser radiation into at least two partial beams;
- and
- superimposing the partial beams in an irradiation plane in which a major side of the carrier remote from the semiconductor layer sequence is located,
- wherein
- an angle between the at least two partial beams at the irradiation plane is 7.5° to 50° and an angle between the partial beams and a perpendicular of the irradiation plane is 0° to 30°,
- the laser radiation is pulsed laser radiation and a pulse duration of the laser radiation is at most 50 ns,
- an optical path length difference between the partial beams corresponds to at least 0.025 times and at most 0.25 times the pulse duration, and
- an average roughness of the major side of the carrier remote from the semiconductor layer sequence is 0.1 μm to 5.0 μm.
A device for a laser lift-off method for severing at least one layer from a carrier comprising:
- a laser that generates laser radiation;
- and
- at least one beam splitter;
- wherein
- the laser radiation is divided into at least two partial beams by the at least one beam splitter,
- the at least two partial beams are superimposed in an irradiation plane,
- the irradiation plane is provided such that a major side of the carrier remote from the layer is arranged therein, and
- an angle between the at least two partial beams at the irradiation plane is at least 1.0°, and
- the laser radiation is divided by N−1 beam splitters into N partial beams according to a reflectivity R(N) of the Nth beam splitter:
- R(N)=1/(N+1),
- wherein N is an integer of 3 to 8, and the beam splitters are arranged with increasing reflectivity along a beam path towards the irradiation plane.
Dependencies are inferred from the claim text.