Pattern transfer method

A pattern transfer method comprising:

• forming a photoreactive resin on a substrate to be processed;
• pressing a mold against the photoreactive resin, the mold including a transparent substrate having a concave-convex pattern, and a light-blocking film provided on a part of surfaces of the concave-convex pattern, the transparent substrate including a first portion protruding the most among substrate portions forming the concave-convex pattern, and a second portion depressed with respect to the first portion;
• irradiating the photoreactive resin with light through the mold in a state in which the mold is pressed against the photoreactive resin;
• baking the photoreactive resin in a state in which the mold is pressed against the photoreactive resin after irradiating the photoreactive resin with the light;
• releasing the mold from the photoreactive resin after baking the photoreactive resin;
• and
• rinsing the photoreactive resin with a rinsing solution after releasing the mold;
• wherein
• the light-blocking film is formed only on a bottom surface of the first portion among the bottom surface of the first portion, a side surface of the first portion, and a bottom surface of the second portion, so that only the side surface of the first portion and the bottom surface of the second portion are open from the light-blocking film among the bottom surface of the first portion, the side surface of the first portion, and the bottom surface of the second portion, or
• the light-blocking film is formed only on the side surface of the first portion and the bottom surface of the second portion among the bottom surface of the first portion, the side surface of the first portion, and the bottom surface of the second portion, so that only the bottom surface of the first portion is open from the light-blocking film among the bottom surface of the first portion, the side surface of the first portion, and the bottom surface of the second portion.