Polycrystalline silicon thick films for photovoltaic devices or the like, and methods of making same
AssigneeGuardian Industries Corp.
InventorsVijayen S. Veerasamy, Martin D. Bracamonte
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Abstract
A method of manufacturing a polycrystalline silicon film includes: depositing a catalyst layer including nickel and depositing nickel nanoparticles on a substrate; exposing the catalyst layer and the nanoparticles to at least silane gas; and heat treating the substrate coated with the catalyst layer and the nanoparticles during at least part of the exposing to silane gas in growing a silicon based film on the substrate.
Claims16
A method of manufacturing a polycrystalline film comprising silicon on a substrate, the method comprising:
- depositing a catalyst layer comprising nickel, and depositing nanoparticles, on the substrate;
- exposing the catalyst layer and the nanoparticles to silane gas;
- and
- heat treating the substrate coated with the catalyst layer and the nanoparticles during at least part of said exposing to silane gas, in growing a film comprising silicon on the substrate.
A method of manufacturing a polycrystalline film comprising silicon on a substrate, the method comprising:
- depositing a catalyst layer, and depositing nanoparticles comprising nickel, on the substrate;
- exposing the catalyst layer and the nanoparticles to silane gas;
- and
- heat treating the substrate coated with the catalyst layer and the nanoparticles during at least part of said exposing to silane gas, in growing a film comprising silicon on the substrate.
Dependencies are inferred from the claim text.