Inspection method, inspection apparatus, exposure control method, exposure system, and semiconductor device
AssigneeNikon Corporation
InventorKazuhiko Fukazawa
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Abstract
There is provided an inspection method for inspecting a substrate supporting portion configured to support a substrate during an exposure performed by an exposure apparatus, the method including: irradiating a surface of the exposed substrate with an illumination light beam; detecting reflected light from a pattern in the irradiated surface; determining a focusing state at the time of exposing the pattern of the substrate based on the detected reflected light; and inspecting a state of the substrate supporting portion based on the focusing state.
Claims8
An inspection method for inspecting a substrate supporting portion configured to support a substrate during an exposure performed by an exposure apparatus, the method comprising:
- irradiating, with an illumination light beam, a surface of the substrate on which a pattern has been formed by an exposure;
- detecting reflected light from a pattern in the irradiated surface;
- determining a focusing state of the pattern of the substrate based on the detected reflected light;
- and
- inspecting a condition of the substrate supporting portion based on the focusing state.
Dependencies are inferred from the claim text.