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US 8,945,814 B2Granted
Acid generators and photoresists comprising same
AssigneeRohm and Haas Electronic Materials LLC
InventorsJames F. Cameron, Vipul Jain, Paul J. LaBeaume, Jin Wuk Sung, James W. Thackeray
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Abstract
Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
Claims9
A photoresist composition comprising:
- (a) a polymer;
- and
- (b) an acid generator that comprises a cation component selected from the group consisting of:
- (i) 5-(4-(2-(1-ethylcyclopentyloxy)-2-oxoethoxy)-3,5-dimethylphenyl)-5H -dibenzo[b,d]thiophenium;
- and
- (ii) 5-(3,5-dimethyl-4-(2-oxo-2-(2-phenylpropan-2-yloxy)ethoxy)phenyl)-5H -dibenzo[b,d]thiophenium.
3 more elements
A photoresist composition comprising:
- (a) a polymer;
- and
- (b) an acid generator selected from the group consisting of:
- (i) 5-(4-(2-(1 -ethylcyclopentyloxy)-2-oxoethoxy)-3,5-dimethylphenyl)-5H -dibenzo[b,d]thiophenium 3-hydroxyadamantane-acetoxy-1,1,2,2-tetrafluorobutane-1-sulfonate;
- (ii) 5-(3,5-dimethyl-4-(2-oxo-2-(2-phenylpropan-2-yloxy)ethoxy)phenyl)-5H -dibenzo[b,d]thiophenium 3-hydroxyadamantane-acetoxy-1,1,2,2-tetrafluorobutane-1 -sulfonate;
- (iii) 5-(4-(2-(1-ethylcyclopentyloxy)-2-oxoethoxy)-3,5-dimethylphenyl)-5H -dibenzo[b,d]thiophenium 4-((4R)-4-((8R,9S,10S,13R,14S,17R)-10,13-dimethyl-3,7,12-trioxohexadecahydro-1H-cyclopenta[a]phenanthren-17-yl)pentanoyloxy)-1,1,2,2-tetrafluorobutane-1-sulfonate;
- and
- (iv) 5-(3,5-dimethyl-4-(2-oxo-2-(2-phenylpropan-2-yloxy)ethoxy)phenyl)-5H -dibenzo[b,d]thiophenium 4-((4R)-4-((8R,9S,10S,13R,14S,17R)-10,13-dimethyl-3,7,12-trioxohexadecahydro-1H-cyclopenta[a]phenanthren-17-yl)pentanoyloxy)-1,1,2,2-tetrafluorobutane-1-sulfonate.
5 more elements
An acid generator that comprises a cation component selected from the group consisting of:
- (i) 5-(4-(2-(1-ethylcyclopentyloxy)-2-oxoethoxy)-3,5-dimethylphenyl)-5H -dibenzo[b,d]thiophenium;
- and
- (ii) 5-(3,5-dimethyl-4-(2-oxo-2-(2-phenylpropan-2-yloxy)ethoxy)phenyl)-5H -dibenzo[b,d]thiophenium.
Dependencies are inferred from the claim text.