Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorNaoto Motoike
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Abstract
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S), the organic solvent component (S) containing an organic solvent (S1) including a compound represented by general formula (s-1) shown below and the acid-generator component (B) being an onium salt (in the formula, X represents a single bond or an alkylene group of 1 to 3 carbon atoms; and n represents an integer of 0 to 3).
Claims20
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure and an organic solvent component (S),
- the organic solvent component (S) comprising an organic solvent (S1) comprising a compound represented by general formula (s-1) shown below, and the acid-generator component (B) being an onium salt:
- wherein X represents a single bond or an alkylene group of 1 to 3 carbon atoms;
- and n represents an integer of 0 to 3.
Dependencies are inferred from the claim text.