Fluorinated monomer, fluorinated polymer, resist composition, and patterning process

#This non-provisional application claims priority under 35 U.S.C. §119(a) on Patent Application No. 2009-290054 filed in Japan on Dec. 22, 2009, the entire contents of which are hereby incorporated by reference.

#This invention relates to novel fluorinated monomers (or polymerizable compounds) which are useful as raw materials for the synthesis of functional, pharmaceutical and agricultural materials. In conjunction with a photolithography process for the microfabrication of semiconductor devices, and particularly to an immersion photolithography process involving directing ArF excimer laser radiation having a wavelength of 193 nm from a projection lens toward a resist-coated substrate, with a liquid (e.g., water) intervening between the lens and the substrate, the fluorinated monomer is useful in forming an additive polymer to be added to formulate a radiation-sensitive resist composition having high transparency and improved development properties.

#This invention also relates to a polymer comprising recurring units derived from the fluorinated monomer, a photoresist composition comprising the polymer, and a process for forming a pattern using the photoresist composition.

#The singular forms “a”, “an” and “the” include plural referents unless the context clearly dictates otherwise. The notation (Cn-Cm) means a group containing from n to m carbon atoms per group. The abbreviation “phr” is parts by weight per 100 parts by weight of the base resin.

#While a certain compound is herein represented by a chemical formula, many compounds have a chemical structure for which there can exist enantiomers or diastereomers. Each chemical formula collectively represents all such stereoisomers, unless otherwise stated. Such stereoisomers may be used alone or in admixture.

#Fluorinated Monomer